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  • 1990-1994  (13)
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Material
Years
Year
  • 1
    Electronic Resource
    Electronic Resource
    Design studies for an advanced ECR ion source (abstract)a) : Proceedings of 5th international conference on ion sources (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1100-1100 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Magnet design codes, plasma dispersion solvers, and particle-in-cell (PIC) simulation codes have been used to arrive at the first step in the design of an advanced ion source based on ECR technology. The advanced concept design uses a minimum-B magnetic mirror geometry, which consists of a multicusp magnetic field, to assist in confining the plasma radially, a flat central field for tuning to the ECR resonant condition, and specially tailored mirror fields in the end zones to confine the plasma in the axial direction. The magnetic field is designed to achieve an axially symmetric plasma volume with constant mode-B, which extends over the length of the central field region. The design permits separation of the "tune'' and confinement magnetic fields, thus enabling the use of low-frequency, low-cost microwave power sources; the location and increased physical size of the ECR zone over those in conventional sources is commensurate with the generation of higher beam intensities, higher charge states and a higher degree of ionization. A summary of the results of these studies is presented in this report.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1145076
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
  • 2
    Electronic Resource
    Electronic Resource
    Design features of a high-intensity, cesium-sputter/plasma-sputter negative ion sourcea) (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 2006-2011 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A versatile, high-intensity, negative ion source has been designed and is now under construction which can be operated in either the cesium-sputter or plasma-sputter mode. The cesium-sputter mode can be effected by installation of a newly designed conical-geometry cesium-surface ionizer; for operation in the plasma-sputter mode, the surface ionizer is removed and either a hot filament or rf antenna plasma-discharge igniter is installed. A multicusp magnetic field is specifically provided confining the plasma in the radial direction when the plasma-sputter mode is selected. This arrangement allows comparison of the two modes of operation. Brief descriptions of the design features, ion optics, and anticipated performances of the two source geometries will be presented in this report.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144804
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
  • 3
    Electronic Resource
    Electronic Resource
    Selection and design of ion sources for use at the Holifield radioactive ion beam facilitya) (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 2012-2018 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The Holifield Radioactive Ion Beam Facility now under construction at the Oak Ridge National Laboratory will use the 25 MV tandem accelerator for the acceleration of radioactive ion beams to energies appropriate for research in nuclear physics; negative ion beams are, therefore, required for injection into the tandem accelerator. Because charge exchange is an efficient means for converting initially positive ion beams to negative ion beams, both positive and negative ion sources are viable options for use at the facility. The choice of the type of ion source will depend on the overall efficiency for generating the radioactive species of interest. Although direct-extraction negative ion sources are clearly desirable, the ion formation efficiencies are often too low for practical consideration; for this situation, positive ion sources, in combination with charge exchange, are the logical choice. The high-temperature version of the CERN-ISOLDE positive ion source has been selected and a modified version of the source designed and fabricated for initial use at the facility because of its low emittance, relatively high ionization efficiencies, and species versatility, and because it has been engineered for remote installation, removal, and servicing as required for safe handling in a high-radiation-level ISOL facility. The source will be primarily used to generate ion beams from elements with intermediate to low electron affinities. Prototype plasma-sputter negative ion sources and negative surface-ionization sources are under design consideration for generating radioactive ion beams from high-electron-affinity elements. The design features of these sources and expected efficiencies and beam qualities (emittances) will be described in this report.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144805
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
  • 4
    Electronic Resource
    Electronic Resource
    Design features of a high-intensity, cesium-sputter/plasma-sputter negative ion source (abstract)a) : Proceedings of 5th international conference on ion sources (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1222-1222 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A versatile, high-intensity, negative ion source has been designed and is now under construction which can be operated in either the cesium-sputter or plasma-sputter mode. The cesium-sputter mode can be effected by installation of a newly designed conical-geometry cesium-surface ionizer; for operation in the plasma-sputter mode, the surface ionizer is removed and either a hot-filament or rf antenna plasma-discharge igniter is installed. A multicusp magnetic field is specifically provided for confining the plasma in the radial direction when the plasma-sputter mode is selected. This arrangement allows comparison of the two modes of operation. Brief descriptions of the design features, ion optics, and anticipated performances of the two source geometries will be presented in this report.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1145012
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
  • 5
    Electronic Resource
    Electronic Resource
    High-intensity, heavy negative ion sources based on the sputter principle (invited) : Proceedings of 5th international conference on ion sources (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1141-1147 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Due to their ease of operation, simplicity, long lifetime, and wide range of species capabilities, negative ion sources predicated on the sputter principle are being used for an increasing number of diverse applications. Sources based on this technology have been developed which utilize either direct cesium-surface ionization, or a plasma seeded with cesium to form positive ion beams for sputtering sample materials from which negative ion beams are generated. This article will include a brief review of the fundamental processes underlying negative ion formation by the sputter technique, as well as describe a selected number of recent ion source developments which exemplify the state-of-the art of this technology.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1145040
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
  • 6
    Electronic Resource
    Electronic Resource
    Selection and design of ion sources for use at the Holifield Radioactive Ion Beam Facility (abstract)a) : Proceedings of 5th international conference on ion sources (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 1391-1391 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The Holifield Radioactive Ion Beam Facility now under construction at the Oak Ridge National Laboratory will use the 25-MV tandem accelerator for the acceleration of radioactive ion beams to energies appropriate for research in nuclear physics; negative ion beams are, therefore, required for injection into the tandem accelerator. Because charge exchange is an efficient means for converting initially positive ion beams to negative ion beams, both positive and negative ion sources are viable options for use at the facility. The choice of the type of ion source will depend on the overall efficiency for generating the radioactive species of interest. Although direct-extraction negative ion sources are clearly desirable, the ion formation efficiencies are often too low for practical consideration; for this situation, positive ion sources, in combination with charge exchange, are the logical choice. The high-temperature version of the CERN-ISOLDE positive ion source has been selected and a modified version of the source designed and fabricated for initial use at the facility because of its low emittance, relatively high ionization efficiencies and species versatility, and because it has been engineered for remote installation, removal and servicing as required for safe handling in a high-radiation-level ISOL facility. The source will be primarily used to generate ion beams from elements with intermediate to low ionization potentials. Prototype plasma-sputter negative ion sources and negative surface-ionization sources are under design consideration for generating radioactive ion beams from high-electron-affinity elements. The design features of these sources and expected efficiencies and beam qualities (emittances) will be described in this report.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144970
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
  • 7
    Electronic Resource
    Electronic Resource
    Design studies for an advanced ECR ion source (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 775-787 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Magnet design codes, plasma dispersion solvers, and particle-in-cell (PIC) simulation codes have been used to arrive at the first step in the design of an advanced ion source based on electron cyclotron resonance (ECR) technology. The advanced concept design uses a minimum-B magnetic mirror geometry which consists of a multicusp magnetic field to assist in confining the plasma radially, a flat central field for tuning to the ECR resonant condition, and specially tailored mirror fields in the end zones to confine the plasma in the axial direction. The magnetic field is designed to achieve an axially symmetric plasma "volume'' with constant mod-B, which extends over the length of the central field region. This design, which strongly contrasts with "surface'' ECR zones characteristic of conventional ECR ion sources, results in dramatic increases in the absorption of rf power, thereby increasing the electron temperature and "hot'' electron population within the ionization volume of the source. The creation of a volume rather than a surface ECR zone is, therefore, commensurate with the generation of higher beam intensities, higher charge states, and a higher degree of ionization. A summary of the results of these studies is presented in this report.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144954
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
  • 8
    Electronic Resource
    Electronic Resource
    Emittance characteristics of negative ion beams generated by the sputter technique : International conference on ion sources (1990)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 505-507 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Average emittance data for ion beams extracted from cesium-sputter negative ion sources equipped with spherical, ellipsoidal, and cylindrical geometry cesium-surface ionizers are presented. The attributes of the respective source geometries are described in terms of their cesium ion optical properties. The results of recent measurement of the emittances of momentum-analyzed beams extracted from the ellipsoidal geometry source are also presented. These measurements indicate the presence of a species-dependent effect. The effect is believed to be attributable to differences in the energy spreads of the respective negative ion beams introduced by the sputter generation process.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1141236
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
  • 9
    Electronic Resource
    Electronic Resource
    A lithium liquid metal ion source suitable for high voltage terminal applications : International conference on ion sources (1990)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 502-504 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Liquid metal ion sources offer potential improvement in lateral resolution over conventionally used gaseous sources for MeV microprobe applications because of their intrinsic brightnesses. The use of a Li liquid metal ion source is particularly attractive because of the increased sensitivity of lithium for detecting hydrogen (hydrogen profiling) and for detecting near-surface contaminants through high-resolution Rutherford backscattering spectrometry. However, the technical difficulty of occasional sparking between the needle and extraction electrode requires that the needle of the Li liquid metal ion source be rewetted before reignition can be effected; this problem makes Li liquid metal ion sources of the usual design risky for operation in the insulated high-voltage terminals of accelerators used in such applications. We have designed a reliable, long-lived, Li liquid-metal ion source which has provisions for overcoming this limitation. The design features and performance characteristics of the source are described in this article.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1141235
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
  • 10
    Electronic Resource
    Electronic Resource
    High-intensity plasma-sputter heavy negative-ion source (invited) : International conference on ion sources (1990)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 372-377 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A multicusp magnetic field plasma-surface ion source, normally used for H−ion-beam formation, has been modified for the generation of high-intensity, pulsed, heavy-negative-ion beams suitable for a variety of uses. A brief description of the source and basic pulsed-mode operational data (e.g., intensity versus cesium oven temperature, sputter probe voltage, and discharge pressure) are given. In addition, illustrative examples of intensity versus time and the mass distributions of ion beams extracted from a number of samples, along with emittance data, are also presented. Preliminary results obtained during dc operation of the source under low-discharge-power conditions suggest that sources of this type may alo be used to produce high-intensity (mA) dc beams.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1141298
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
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