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  • 1
    ISSN: 1432-0630
    Keywords: 66.30h ; 62.40
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The diffusion coefficients (D) of Au in three binary amorphous Zr x Ni100−x (x=61, 65, and 67) alloys were measured in the temperature range 549–623 K using the technique of the Rutherford Backscattering Spectrometry (RBS). The D values were found to lie in the range 1.0×10−21–9.0×10−20 m2s−1 for different alloys. The activation energy (Q) was calculated in each case on the basis of an observed Arrhenius temperature dependence of D. The activation energy was found to scale with the crystallization temperature (T x) of the alloy. Other published measurements for Au diffusion in amorphous Zr-Ni alloys also appear to follow the scaling relation between Q and T x.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    Annals of the New York Academy of Sciences 586 (1990), S. 0 
    ISSN: 1749-6632
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Natural Sciences in General
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Homoepitaxial Si films were deposited using an ArF excimer laser beam parallel to the substrate to photodissociate Si2H6 at low temperatures (250–350 °C) under laser intensity and Si2H6 partial pressure conditions that result in low initial photofragment concentrations (〈 1013 cm−3). Total pressure and flow conditions were chosen such that there is little secondary photolysis of the initial photofragments. The deposition yield of solid Si from photoexcited Si2H6 is estimated to be 0.20±0.04, indicating that in order for film growth to result solely from the primary products in ArF laser (193 nm) photolysis of Si2H6, a sticking coefficient ≥0.6 must be assigned to the dominant growth precursor. Growth rates vary linearly with laser intensity and Si2H6 partial pressure over a range of 1–15 mJ/cm2 pulse and 5–40 mTorr, respectively. Increasing the distance between the laser-beam axis and the silicon substrate results in a reduction of the growth rate that can be explained by gas-phase chemical reaction of the growth precursors as they diffuse to the substrate. Epitaxy is maintained for temperatures above the threshold for thermal decomposition of surface (SiH2)n chains at ∼250 °C, and for temperatures below the onset of Si2H6 pyrolysis and rapid thermal desorption of surface H2 at ∼350 °C.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 2934-2940 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Nanocomposites of Al-In, Al-Pb, and Zn-Pb have been prepared and characterized using rapid quenching techniques and the nature of superconducting transitions in them has been studied by resistivity measurements. The precipitated second phases (In and Pb) have particle sizes (d) of a few tens of nanometers such that ξ0≥d≥dmin, where ξ0 is the superconducting zero temperature coherence length and dmin is the minimum particle size that supports superconductivity. The onset of superconductivity generally starts in samples with d∼ξ0 and progressively other grains with d≤ξ0 become superconducting. We suggest that the proximity effect of the matrix plays a significant role. In an Al-In system, even with 40 wt.% In, the zero resistivity state is obtained at T∼1.33 times the Tc of Al. But in Al-Pb and Zn-Pb, the zero resistivity state is obtained at T∼4 and 5 times the Tc of Al and Zn with only 10–15 wt % Pb, respectively.
    Type of Medium: Electronic Resource
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  • 5
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Boron diffusion in polycrystalline Si-on-single crystal Si systems has been studied by secondary ion mass spectrometry. The extrapolated B-diffusion profiles in polycrystalline Si and in the single crystal Si substrate reveal a discontinuity at the polycrystalline Si-single crystal Si interface. The discontinuity in the B profiles is believed to occur due to the blockage of B-defect complexes by the interfacial oxide between polycrystalline Si and the single-crystal Si substrate, as well as the immobility of these defect complexes in single crystal Si. The B in the implant peak region above the B solid solubility limit is found to be immobile in single crystal Si during annealing due to the formation of electrically inactive B-defect complexes. In polycrystalline Si, however, our results show that the B in the peak region spreads out more rapidly than in single crystal Si possibly due to the diffusion of B-defect complexes along grain boundaries. The B-defect complexes are electrically inactive as determined by spreading resistance analysis. If the B concentration is lowered below the solid solubility limit, either by decreasing the dose or by raising the anneal temperature, no discontinuity is observed in the B profile across the polycrystalline Si-single crystal Si interface.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 4384-4387 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The chemical and electronic aspects of a GaAs (100) surface passivated by selenium sulfide (SeS2) have been investigated by x-ray photoelectron spectroscopy and photoluminescence. It has been observed that this treatment gives rise to an arsenic selenide (As2Se3) terminated surface. No S—GaAs bonds were observed. The remarkable electronic properties and the formation of the chemically and thermally stable As2Se3 phase reveals the successful passivation. Passivation of GaAs in single step and identification of a single selenium species on the surface are considered to be the major advantages of using SeS2.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    Geophysical journal international 102 (1990), S. 0 
    ISSN: 1365-246X
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Geosciences
    Notes: Multidomain ferro- and ferrimagnets carrying a thermoremanent magnetization (TRM) display a maximum in remanent magnetization just below the Curie temperature Tc when continuously demagnetized in zero field. We interpret this demagnetization peak to be indicative of the presence of TRM domain wall moments that grow in a small temperature interval (near Tc) upon heating where the domain wall volume increases at a rate faster than the decrease in spontaneous magnetization Msp. Hysteresis measurements in the vicinity of Tc on a single crystal of magnetite show that the spontaneous magnetization may be orders of magnitude smaller than the strong field magnetization measured in Ms/T curves. Micromagnetic calculations using experimentally determined Msp/T data suggest that the single domain (SD) threshold for magnetite can increase by more than an order of magnitude from room temperature to just below Tc in support of the domain wall moment model.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 7618-7620 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report on a modified Kroemer's analysis [Appl. Phys. Lett. 36, 295 (1980)] for the determination of the band offset ΔEc of a single quantum well from a carrier profile obtained by capacitance-voltage measurement. The procedure is applied to a pseudomorphic GaAs/InGaAs/GaAs strained layer structure.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 2324-2330 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thermal processing of InP at temperatures above 500 °C is indispensable in the growth and device fabrication of InGaAsP alloy semiconductors for optoelectronic and microwave applications. Incongruous loss of P at these temperatures creates native defects and their complexes. The presence of such defects modifies the electrical and optical properties of the material resulting in poor device performance. In addition, native defects play a significant role in dopant diffusion which is a topic of current interest. We have measured deep-level photoluminescence (PL) on undoped InP after heat treatments at 500 and 550 °C in an open-tube processing system in different protective environments of powder InP, and Sn-InP melt together with an InP cover. In this paper we shall present the PL results which have bearing on the question of defects. We find that (1) the Sn-InP melt provides better protection in preserving the overall luminescence in InP; (2) the deep-level PL related to defects has at least two components in the virgin samples, viz., MnIn, and band C, which is a native defect complex related to VP; (3) a new defect appears in samples heated in a P-deficient environment; and (4) the enhancement in the deep-level luminescence intensity after heat treatment can be attributed to the excess defect concentrations existing under nonequilibrium conditions of an open-tube processing environment.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 5533-5537 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The acquisition of viscous magnetization has been measured on a single domain magnetite sample in the temperature range 80 to 330 K and in applied fields up to 1540 Oe. Based on Néel's single domain theory, we have calculated the field and temperature dependence of viscous acquisition by numerical two-dimensional integration, using experimentally determined volume and switching field distributions. Predicted and experimental viscosity coefficients do not match, with especially strong discrepancies below the Verwey transition. The experimental acquisition coefficient is larger below the transition than at room temperature, even though the corresponding switching field distributions are nearly identical. Thus we cannot explain single domain viscosity by switching field and volume distributions alone, and we suspect that stress plays a prominent role.
    Type of Medium: Electronic Resource
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