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  • 1990-1994  (2)
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    European journal of clinical pharmacology 45 (1993), S. 343-346 
    ISSN: 1432-1041
    Keywords: Probucol ; Hyperlipidaemia ; low density lipoprotein ; LDL-cholesterol ; lipoprotein peroxidation
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Medicine
    Notes: Summary The relationship between the content of probucol in plasma and lipid lowering was studied after administration of probucol. The study group consisted of 44 patients with Type II hyperlipidaemia (mean age 56 y). Total cholesterol level was decreased from 293 to 232 mg · dl−1 by the administration of probucol. The plasma probucol concentration was 2.03 mg · dl−1 after 4 weeks of administration of 500 mg b. d. Although there was no relationship between the change in total cholesterol and the plasma probucol, a linerar relation was observed between the decrease in LDL-cholesterol concentration and the probucol concentration in LDL. Neither the VLDL nor the HDL-probucol content were related to the magnitude of the decrease in lipoprotein cholesterol. The present study has demonstrated that an increase in the probucol content in LDL was associated with a decrease in plasma LDL-cholesterol.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 4258-4267 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A variety of effects of substrate bias upon an electron cyclotron resonance plasma deposition have been studied, taking the deposition of amorphous boron carbide films as an example. First, the impact energy of ions incident on substrates was studied through the variation of the sheath potentials formed on insulating and conducting substrates. For this purpose, the plasma potential (Vp) was measured by the bias current-voltage (Ib-Vb) analysis, and the floating potential (Vf) was measured by the Langmuir probe method. These analyses show that the plasma potential is sufficiently influenced by the substrate bias for positive biases even if the area of the bias electrode is small. The energy of ions incident on conducting substrates is not effectively changed by imposing a positive bias. This effect can be explained in terms of the global balance of the electron and ion currents. This consideration leads to the criterion for the area of bias electrode at which the substrate bias perturbs the plasma potential. Next, the effects of the substrate bias upon the deposition processes and properties of the deposited films were studied through the variations of the deposition rates and the infrared absorption due to the atomic vibrations in the films. The deposition rates vary with the substrate bias according to the variation of sheath potentials: Vp−Vf for insulating substrates and Vp−Vb for conducting substrates. As the substrate bias increases negatively, the deposition rate on conducting substrates increases. This increase is hardly explained by the direct contribution of ions to the deposition. The comparison with other relevant discharge phenomena leads to the importance of the secondary electrons emitted from the substrate surface caused by the ion bombardment. The secondary electrons increase the densities of condensable neutral radicals in the vicinity of the substrate in a way similar to dc discharges.
    Type of Medium: Electronic Resource
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