ISSN:
1573-7357
Source:
Springer Online Journal Archives 1860-2000
Topics:
Physics
Notes:
Abstract Measurements of the low-field Hall coefficientR H of single-crystal copper films were made at 4.2 K by the use of a SQUID. The surface normaln of the samples was directed in the [100], [110], and [111] directions and the ratio of the thickness to the mean free path ranged from 0.1 to 0.7. It is found that the effect of surface scattering causesR H to decrease whenn ‖ [100], whereas it causesR H to increase whenn ‖ [110] and [111]. This behavior is interpreted in terms of the geometrical characteristics of the Fermi surface.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00681636
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