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  • 1970-1974  (2)
Datenquelle
Materialart
Erscheinungszeitraum
Jahr
  • 1
    Digitale Medien
    Digitale Medien
    Secondary processes in the evolution of sputter-topographies (1972)
    Springer
    Journal of materials science 7 (1972), S. 404-412 
    Details
    ISSN: 1573-4803
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Maschinenbau
    Notizen: Abstract Topographies of silica glass surfaces developed by 20 keV Ar+ irradiation contain features which are not adequately explained by considering only the variation of sputtering yield with the ion-incidence angle. These features are sharply defined and could lead to serious misinterpretation of specimen structures when sputter-erosion is used as a microscopic sectioning technique. Three mechanisms are discussed which together could account for the observed discrepancies, the first being ion-reflection at grazing incidence, the second the phenomenon of forward-peaked emission of high-energy secondary particles under irradiation at high angles of incidence and the third being re-deposition of sputtered material onto closely adjacent planes. A general expression is derived for this latter mechanism for a cosine spatial distribution of sputtered particles.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1007/BF02403403
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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    Artikel (Nationallizenzen)
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  • 2
    Digitale Medien
    Digitale Medien
    Secondary processes in the evolution of sputter-topographies (1972)
    Springer
    Journal of materials science 7 (1972), S. 404-412 
    Details
    ISSN: 1573-4803
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Maschinenbau
    Notizen: Abstract Topographies of silica glass surfaces developed by 20 keV Ar+ irradiation contain features which are not adequately explained by considering only the variation of sputtering yield with the ion-incidence angle. These features are sharply defined and could lead to serious misinterpretation of specimen structures when sputter-erosion is used as a microscopic sectioning technique. Three mechanisms are discussed which together could account for the observed discrepancies, the first being ion-reflection at grazing incidence, the second the phenomenon of forward-peaked emission of high-energy secondary particles under irradiation at high angles of incidence and the third being re-deposition of sputtered material onto closely adjacent planes. A general expression is derived for this latter mechanism for a cosine spatial distribution of sputtered particles.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1007/BF00553763
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
    Artikel (Nationallizenzen)
    Volltext
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