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  • 1
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report the results of structural, chemical, and extreme ultraviolet (EUV) characterization of Si/Mo multilayers grown by sputtering and by UHV evaporation. This study includes mirrors designed for normal incidence with peak reflectivities Rpeak between 22 and 24 nm, and 45° mirrors having Rpeak between 16 and 19 nm. The deposition conditions were varied to produce multilayers with a wide range of interface morphologies. A variety of techniques were used to determine the structure and composition of the multilayers, including x-ray diffraction, transmission electron microscopy, Rutherford backscattering spectroscopy, and Auger depth profiling. All of the mirrors have amorphous Si layers and polycrystalline Mo layers with thin amorphous alloy interlayers. We obtain good fits to the low-angle x-ray diffraction data only when these interlayers are taken into account. The best sputter-deposited mirrors were made at the lowest Ar pressure studied, 3 mTorr. The best evaporated mirrors were produced at a substrate temperature of 200 °C. The EUV reflectivity as a function of wavelength was measured using synchrotron radiation. Both the multilayer structure and surface contamination significantly affect the EUV reflectivity, and must be considered to obtain good fits to the reflectivity curves. The best 45° mirror had a peak reflectivity of 53% at 18.6 nm for 100% S-polarized light, and the best normal-incidence mirror had a peak reflectivity of 33% at 23.6 nm.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 3814-3821 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Semi-insulating Fe-doped 〈100〉-InP wafers were implanted in a nonchanneling direction with 300 keV Si+ and 600 keV Se++ ions in the dose range of 1×1012–1×1016 cm−2. The implantation temperature was varied between room temperature and 425 K. The samples were capped and short time annealed by means of a graphite strip heater at 700–975 °C. The defect investigation of the as-implanted as well as of the annealed samples was performed with Rutherford backscattering spectrometry. A simple vacancy diffusion model is applied to describe the damage production, which yields critical implantation temperatures for amorphization. These temperatures are approximately 390 K for Si and 420 K for Se, for higher temperatures amorphization is not possible in InP. The electrical properties of the annealed layers are measured by the van der Pauw–Hall technique. The results are discussed with respect to the residual damage after annealing. Saturation values of the electrical activation were achieved at 3×1014 cm−2 for Si and 4×1014 cm−2 for Se, respectively.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 3229-3232 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A new beamline for radiometric applications (e.g., detector calibration and reflectometry) has been installed and characterized at the laboratory of the Physikalisch-Technische Bundesanstalt at the electron storage ring BESSY. The beamline is equipped with a SX700 type plane grating monochromator and a toroidal mirror behind the exit slit of the monochromator for collimating the radiation to allow angle resolved reflectometry. A divergence of 0.1 mrad has been achieved. The beamline has been optimized for high spectral purity of the radiation. Within the photon energy range from 40 to about 1500 eV the total amount of stray light and higher order radiation stays below 1%. A photon flux of up to 1011 s−1 has been measured in the focal point of the toroidal mirror. It corresponds to a radiant power of a few μW and thus allows use of a cryogenic radiometer for detector calibration. The details of the beamline layout and the results of the performance characterization are presented.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 2601-2603 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thermal treatment of a Mo/Si multilayer stack enhances its reflectivity in the soft x-ray region. The multilayer x-ray mirrors are fabricated by electron beam evaporation in ultrahigh vacuum. In situ measurement of the reflectivity during the deposition allows thickness control and an observation of changes in quality of the boundaries. By heating the substrates during deposition we obtain a smoothing of the interfaces. This leads to x-ray mirrors with peak reflectivity around 50% for normal incident radiation of wavelengths between 130 and 140 A(ring).
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 63 (1993), S. 2207-2209 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Multilayer soft x-ray mirrors with an absorber consisting of the mixture Mo0.5Si0.5 have been fabricated by electron-beam evaporation in UHV. This has been done to get soft x-ray normal incidence mirrors for 80–100 eV photon energy with enhanced thermal stability and still high reflectivity. The thermal stability is studied by baking them at temperatures between 600 and 950 °C. The results were compared with multilayers of pure Mo and Si, which were also fabricated by electron-beam evaporation. After each baking step the x-ray mirrors are characterized by small angle CuKα x-ray diffraction. The reflectivity of the first-order Bragg peak is nearly constant up to 20 min baking at 900 °C. Further we present the normal incidence soft x-ray reflectivity for wavelengths between 12 and 18 nm of a Mo0.5Si0.5/Si mirror with 12 double layers (N=12) and of a Mo0.5Si0.5/Si mirror as deposited with 33 double layers (N=33). With the latter a reflectivity of 46% is achieved.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 2280-2282 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We investigated one-dimensional arrays with up to 600 step-edge Josephson junctions (SEJ) fabricated by pulsed laser deposition of YBa2Cu3O7 (YBCO) films on steep steps in epitaxial LaAlO3 substrates. The steps were prepared by Ar-ion milling and the YBCO thin films were patterned either by Ar-ion milling or by an inhibit process. The current-voltage (I-V) characteristics and the Josephson emission of a single SEJ show that it consists of two resistively shunted-junction-type (RSJ) weak links in series which have different critical currents, IC1 and IC2. The I-V characteristics of our arrays were also close to the RSJ-model. The number of series-connected weak links deduced from the I-V curves was usually higher than the number of steps. Histograms of the individual weak link ICs showed two peaks at IC1 and IC2. The IC spread was about ±20% to ±40% of these two values. Radiation from arrays was detected and an evidence of phase locking in Josephson junction clusters obtained.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    Alimentary pharmacology & therapeutics 8 (1994), S. 0 
    ISSN: 1365-2036
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Medicine
    Notes: One hundred and twenty-five patients with duodenal ulcer disease were given continuous ranitidine therapy after initial acute healing. Cumulative remission rates indicated that 95 % of patients were ulcer-free after 1 year, 89% at 2 years, 81% at 3 years, 70% at 4 years and 60% at 5 and 6 years. Nine patients had a second recurrence after healing of the first. No patient developed an ulcer complication. These results support the view that long-term continuous ranitidine therapy prevents ulcer recurrence and complications.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    Alimentary pharmacology & therapeutics 5 (1991), S. 0 
    ISSN: 1365-2036
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Medicine
    Notes: Lansoprazole (AG 1749) is a novel substituted benzimidazole which inhibits gastric acid secretion by blocking H+, K+-ATPase. This randomized, double-blind multicentre trial studied the dose–response relationship of lansoprazole on ulcer healing and compared it with ranitidine in 314 out-patients with endoscopically assessed, symptomatic duodenal ulcer. Cumulative healing rates with Lansoprazole 7.5, 15, and 30 mg o.m. were 48, 59, and 74% at 2 weeks and 75, 84, and 95 % at 4 weeks, respectively (intention-to-treat); the difference of the healing rates between 7.5 and 30 mg groups was significant (P 〈 0.001).Corresponding healing rates for 300 mg ranitidine nocte were 51 and 89 %. Pain relief was similar in all treatment groups. Lansoprazole was well tolerated. During a follow-up of 6 months relapse rates after lansoprazole 7.5, 15, and 30 mg were 21, 29, and 22%, respectively; the relapse rate after ranitidine 300 mg was 20%. In conclusion, lansoprazole provides faster healing of duodenal ulcer than ranitidine and a similar relapse pattern. For further trials in peptic ulcer disease a daily dose of lansoprazole 30 mg o.m. is recommended.
    Type of Medium: Electronic Resource
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  • 9
    ISSN: 1365-2036
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Medicine
    Notes: Pentagastrin stimulated gastric secretion was measured in 12 healthy male subjects after repeated once daily oral administration of 20 and 40 mg BY 1023/SK&F 96022 – a new substituted benzimidazole derivative.Twenty milligrams inhibited acid output compared with placebo by 24% (2.5–3.5 h) and 26% (24.5–25.5 h) after the first oral intake. Inhibition increased to 56% and 50%, respectively, after the seventh oral dose. Forty milligrams inhibited acid output by a mean of 51% (2.5 to 3.5 h) and 52% (24.5–25.5) after the first oral intake. After the seventh dose mean inhibition rose to 85% and 66%, respectively.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    Annals of the New York Academy of Sciences 580 (1990), S. 0 
    ISSN: 1749-6632
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Natural Sciences in General
    Type of Medium: Electronic Resource
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