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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 52 (1991), S. 336-340 
    ISSN: 1432-0649
    Keywords: 34.80 D ; 41.80 Dd ; 42.55 F
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.
    Type of Medium: Electronic Resource
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