ISSN:
1434-6079
Keywords:
52.20.Hv
;
34.50.Lf
;
82.30.−b
Source:
Springer Online Journal Archives 1860-2000
Topics:
Physics
Notes:
Abstract Guided ion beam mass spectrometry is used to measure the cross sections as a function of kinetic energy for reaction of SiH4 with O+(4S), O 2 + (2Πg,v=0), N+(3P), and N 2 + (2Σ g + ,v=0). All four ions react with silane by dissociative charge-transfer to form SiH m + (m=0−3), and all but N 2 + also form SiXH m + products where (m=0−3) andX=O, O2 or N. The overall reactivity of the O+, O 2 + , and N+ systems show little dependence on kinetic energy, but for the case of N 2 + , the reaction probability and product distribution relies heavily on the kinetic energy of the system. The present results are compared with those previously reported for reactions of the rare gas ions with silane [13] and are discussed in terms of vertical ionization from the 1t 2 and 3a 1 bands of SiH4. Thermal reaction rates are also provided and dicussed.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01426693
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