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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 56 (1993), S. 479-492 
    ISSN: 1432-0630
    Keywords: 57.70.−m ; 81.15.Gh ; 81.60.−j
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract A survey is given of in-situ diagnostics of plasma and surface for application in plasma etching and deposition. Especially those diagnostics that increase the fundamental understanding of the elementary processes occurring both within the plasma and at the surface are highlighted. In general, diagnostics are performed to determine the value of a physical parameter. This value is fed into models of plasma or surface, and in that way the understanding of the process is enhanced. In the paper first the most interesting physical parameters are defined. Subsequently the diagnostic techniques currently available to determine those parameters are reviewed.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1572-8986
    Keywords: Electron density ; microwave cavity ; fluorocarbon
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Electron densit ies have been determined /or RF plasmas that were generated within a microwave resonant cavity by measuring the difference of the resonance frequencies with and without plasma. Since that method only yields a value of the electron density weighted ouer the microwave electric field distribution, to obtain real values an assumption on the spatial distribution of the electron density had to he made. Spatial profiles were taken of the emission of a 4s–5p Ar line at 419.8 not (with a small Ar admixture). The electron densities have been determined as a function of pressure and RF power in Ar, CF4, C2 F6 and CHF, plasmas. The results indicate that the electron density for the last three gases decreases as a function of pressure above 50 m Torr. Typical values for the electron density for the investigated parameter range are 1–6 · 103 cm−3. Furthermore, the electron density is the lowest in gases with a high attachment cross .section.
    Type of Medium: Electronic Resource
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