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  • Chemical Engineering  (2)
  • Cell adhesion molecules  (1)
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Monatsschrift Kinderheilkunde 146 (1998), S. S49 
    ISSN: 1433-0474
    Keywords: Schlüsselwörter Oligosaccharide ; Frauenmilch ; Kuhmilch ; Säuglingsnahrungen ; Infektabwehr ; Zelladhäsionsmoleküle ; Key words Oligosaccharides ; Human milk ; Bovine milk ; Infant formula ; Defense system ; Cell adhesion molecules
    Source: Springer Online Journal Archives 1860-2000
    Topics: Medicine
    Description / Table of Contents: Summary About a century ago paediatricians observed that in the faeces of breast-fed infants, Bifidobacterium bifidum was the predominant microorganism compared to those of bottle-fed infants. It was shown thereafter that aminosugar containing oligosaccharides it contains are growth factors for a specific strain of Bifidobacterium. Meanwhile, more than 130 lactose-derived oligosaccharides have been identified in human milk. Some of these components, such as lacto-N-tetraose and lacto-N-fucopentaose I and II, do not occur in minute amounts but in concentrations up to 1–2 g/l. As the total amount of complex oligosaccharides is between 5 and 8 g/l these components must be considered major human-milk constituents. There is striking evidence that human-milk oligosaccharides are potent inhibitors of bacterial adhesion to epithelial surfaces, an initial stage of infective processes. Therefore, these oligosaccharides are considered to be soluble receptor analogues of epithelial cell surfaces participating in the non-immunological defense system of infants fed with human milk. In addition, they may also influence inflammatory processes by acting as ligands for certain cell-adhesion molecules.
    Notes: Zusammenfassung Um die Jahrhundertwende beobachtete man, daß die Darmflora bei gestillten Kindern im Gegensatz zu der bei sog. Flaschenkindern vorwiegend aus Bifidusbakterien besteht. Mitte der 50er Jahre wurde nachgewiesen, daß Oligosaccharide, die Aminozucker enthalten, das Wachstum eines bestimmten Bifidobakterienstamms fördern. Mittlerweile sind mehr als 130 auf Laktose basierende Oligosaccharide in Frauenmilch charakterisiert worden. Einige dieser Oligosaccharide wie die Lakto-N-Tetraose und die Lakto-N-Fucopentaose I und II kommen nicht nur in Spuren, sondern in Konzentrationen bis 1–2 g/l vor. Die Gesamtkonzentration liegt bei 5–8 g/l, so daß man diese Komponenten zu den Hauptmilchinhaltsstoffen zählen muß. Diskussion: Es gibt immer mehr Hinweise darauf, daß diese Komponenten potentielle Inhibitoren der Anhaftung von pathogenen Bakterien und von Viren an Epithelzellen sind, wodurch der erste Schritt eines Infektionsvorgangs verhindert werden könnte. Daher werden solche Oligosaccharide als lösliche Rezeptoranaloga zu Kohlenhydratstrukturen auf Epithelzellen betrachtet, die möglicherweise zu einer besseren Infektabwehr von frauenmilchernährten Neugeborenen beitragen. Außerdem beeinflussen Oligosaccharide in Frauenmilch möglicherweise entzündliche Reaktionen z.B. im Gastrointestinaltrakt, da sie als lösliche Liganden von Zelladhäsionsmolekülen wirken könnten.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 12 (1972), S. 109-111 
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: A new method for removal of thin films of photoresist polymers has been found. When polymeric films are exposed to ultraviolet light in the presence of air, the material can be removed leaving an extremely clean surface, free of carbonaceous material. This process has been examined for a variety of photoresist polymers as well as on nonphotoresist polymers and on a variety of substrates. The process offers a new method of photoresist removal.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 12 (1972), S. 209-212 
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Polymeric films deposited from the vapor of C4Cl6 by the surface-photopolymerization technique are electrically and mechanically continuous on various substrates when very thin. The thickness of the films depends upon irradiation time with wavelengths in the region 2000-3000Å. Re-irradiation in oxygen (air) of the polymeric films with light of these low wavelengths leads to patterned removal of the films. Since films 500Å thick and less can resist etchants for various substrates, a new and extremely thin positive photoresist system is possible. Resolution of etched substrates to lines a few microns wide has been demonstrated. If the polymeric films from C4Cl6 are deposited from the monomeric vapor at lower substrate temperatures they are soluble in various solvents. Re-irradiation with UV light with the films in vacuum produces a patterned fixing of the polymer with respect to acetone. A negative photoresist system is therefore possible. Again, films of thickness 500Å and less can resist various etchants such that substrates can be etched to high resolution.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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