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  • Chemical Engineering  (4)
  • styrene-butadiene block copolymers aromatic polyester  (1)
  • 1
    Electronic Resource
    Electronic Resource
    In-situ direct polycondensation in polymer matrices. II. In-situ direct polycondensation in styrene-butadiene block copolymers (1993)
    Bognor Regis [u.a.] : Wiley-Blackwell
    Journal of Polymer Science Part A: Polymer Chemistry 31 (1993), S. 597-602 
    Details
    ISSN: 0887-624X
    Keywords: in-situ ; direct polycondensation ; styrene-butadiene block copolymers aromatic polyester ; composites ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: Direct polycondensation of 3-substituted-4-hydroxybenzoic acid was carried out in solutions of styrene-butadiene block copolymers (SBS) at room temperature in the presence of triphenylphosphine and hexachloroethane as an initiator for the direct polycondensation of these monomers. Solution casting after the direct polycondensation provided opaque films in which the aromatic polyester was finely dispersed within the matrix of SBS. Mechanical properties of these films were examined by tensile tests. A great improvement of tensile strength was achieved by the incorporation of phenyl substituent in the resulting polyester. In-situ direct polycondensation leads to the formation of new composites of rigid polymers and flexible polymers. © 1993 John Wiley & Sons, Inc.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pola.1993.080310301
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  • 2
    Electronic Resource
    Electronic Resource
    Relationship between electron sensitivity and chemical structures of polymers as EB resists: Poly(lactam thioether) as new positive EB resists (1986)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 26 (1986), S. 653-657 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Poly(lactam thioether) was synthesized from tetrahydro-1,4-thiazepine-5(4H)-one by a ring opening reaction under various conditions and was evaluated as positive electron beam(EB) resist. It was found that poly(lactam thioether) was easily decomposed by EB irradiation. The decomposition by EB exposure may be attributed to cleavage of C—S bonds in the polymer chains. The sensitivity of poly(lactam thioether) was influenced by prebake temperature, molecular weight, and developer, a high sensitivity of 5.3 × 10-6 coulomb/cm2 was observed with a good resolution of less than 1 μm. Poly(lactam thioether) showed a high sensitivity and a high resolution, and is suitable as a positive EB resist.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760261002
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    Relationship between electron sensitivity and chemical structures of polymers as electron beam resists. VI: Electron sensitivity of various acetalized poly(vinyl alcohol)s (1989)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 29 (1989), S. 353-358 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Acetalized poly(vinyl alcohol)s which were synthesized from poly(vinyl alcohol) (PVA) and aldehyde or ketone were evaluated as electron beam (EB) resists, in order to investigate the relationship between EB sensitivity and chemical structures of the polymers. It was found that the acetalized PVAs were easily crosslinked by EB exposure. The main mechanism of crosslinking may be radical reaction at acetal group. The sensitivity of the acetalized PVA depended on the structure of the acetal group. Acetalized PVAs synthesized from benzaldehyde, in which the electron attracting group was substituted on the benzene ring and from linear aliphatic aldehyde having a long alkyl chain, had high sensitivity. A high sensitivity of 7.2 × 10-7 C/cm2 was attained when the acetalized PVA synthesized from p-chloro-benzaldehyde was used. Acetalized PVAs synthesized from PVA and aldehyde having a cyclic structure had an excellent dry etching durability and were suitable as negative EB resists.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760290602
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  • 4
    Electronic Resource
    Electronic Resource
    Relationship between electron sensitivity and chemical structures of polymers as electron beam resist. VII: Electron sensitivity of vinyl polymers containing pendant 1,3-dioxolan groups (1990)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 30 (1990), S. 449-452 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Vinyl polymers containing pendant acetal groups were synthesized using (2,2-dimethyl-l,3-dioxolan-4-yl)methyl acrylate (DMA) and (2,2-dimethyl-l,3-dioxo-lan-4-yl)methyl methacrylate (DMM), and were evaluated as negative electron beam (EB) resists. It was found that the EB sensitivity of polymers containing acetal groups in the side chain was higher than that of polymers containing acetal groups in the main chain. A high sensitivity of 3.6 × 10-8 C/cm2 was observed. Copolymers of DMA or DMM with styrene were also synthesized in order to improve the durability for dry etching process. It was found that the copolymers had an excellent dry etching durability and were adaptable to EB lithography.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760300804
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  • 5
    Electronic Resource
    Electronic Resource
    A polymer complex as a new type of electron beam resist for dry development (1988)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 28 (1988), S. 912-915 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Polymer complex of poly (4-vinylpyrldine) and malonic acid was investigated as a new type of electron beam (EB) resist for dry development, as malonic acid was decomposed by EB irradiation. It was found that the polymer complex could be developed with O2 plasma etching and that the positive resist patterns with high resolution could be obtained. The mechanism for this lithography process was studied by means of IR and ESCA spectra.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760281406
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