ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Use of polyimides with thermal coefficients of expansion comparable to that of the underlying substrate is critical to achieving low stress in microelectronic packaging applications. Photosensitive polyimides are finding increased use because of their significant reduction in device processing steps. A negative working photosensitive polyimide, based on the BPDA/PPD backbone, has been synthesized that incorporates these key features. The polyimide exhibits excellent photosensitivity and lithographic behavior, while retaining many thermal and physical properties of the polymer framework.
Additional Material:
8 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760322113
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