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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Theoretical and applied genetics 101 (2000), S. 15-20 
    ISSN: 1432-2242
    Keywords: Key words Xa21 ; IR72 ; Bacterial leaf blight ; Transformation ; Field testing
    Source: Springer Online Journal Archives 1860-2000
    Topics: Biology
    Notes: Abstract  Based on the characterization of the resistance phenotype and molecular analysis, several homozygous lines carrying Xa21 against the bacterial blight (BB) pathogen were obtained from previously transformed indica rice, IR72. The homozygous line, T103-10, with the best phenotype and seed-setting, was repeatedly tested under normal field conditions to evaluate its levels of resistance to the BB pathogen in Wuhan, China, in 1998 and 1999. The isolates of Xanthomonas oryzae pv oryzae (Xoo) used in this experiments were PXO61, PXO79, PXO99 and PXO112 isolated from the Philippines, T2 isolated from Japan, and Zhe173 isolated from China. The results demonstrated that the transgenic homozygous line expressed the same resistance spectrum, but with a shorter lesion length to each inoculated isolates as the lesion length of the Xa21 donor line IRBB21. The non-transformed control IR72 carrying Xa4 was resistant to PXO61, PXO112, Zhe173 and T2, but susceptible to PXO99 and PXO79. The negative control variety IR24 was susceptible to all isolates under field conditions. The results demonstrated clearly that the Xa21 transgene led to an excellent field performance of the introduced bacterial blight resistance trait on the recipient plants. The yield performance of this transgenic homozygous line, T103-10, is comparable with that of the control under field conditions.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Hoboken, NJ : Wiley-Blackwell
    AIChE Journal 41 (1995), S. 2187-2197 
    ISSN: 0001-1541
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Notes: A numerical computation of the LDV results of Kliafas and Holt is reported for a turbulent gas-solid particle flow in a square-sectioned 90° bend. A Eulerian model with generalized Eulerian solid surface boundary conditions for the particulate-phase momentum exchanges with solid walls are included. The turbulent closure is effected by using the gas-phase RNG-based k-∊ turbulence model, and the particulate turbulence diffusivity is related to the turbulent viscosity of the gas phase. Comparisons are made with experimental data for the mean streamwise velocities of both phases, the streamwise turbulence intensity of the gas phase, and the particulate concentration distribution in the bend. The localized high particulate concentration near the outer curve of the bend that occurs at large Stokes number is accurately predicted. Empirical computational evidence is presented for a relaxation of the minimum particle number density required to allow the use of a continuum model.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 48 (1997), S. 441-446 
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Innere Chlorierung von Nickelbasislegierungen and ihre Beziehung zur Korrosion durch VerdampfungDie Kinetik der inneren Chlorierung von Nickelbasislegierungen im Temperaturbereich zwischen 400°C und 700°C wurde mittels optischer und Rasterelektronenmikroskopie untersucht. Die innere Chlorierung von Ni-4Cr und Ni-4Cr-O,5Ce erfolgte durch Bildung fester Ausscheidungen wie CrCl2 und CeCl3, die thermodynamisch stabil sind und bei den Temperaturen niedrige Dampfdrücke in der Legierungsmatrix haben. Im niedrigeren Temperaturbereich folgte die Kinetik der inneren Chlorierung annähernd einem parabolischen Geschwindigkeitsgesetz. Der Grad der inneren Chlorierung nahm mit steigender Temperatur zu. Im höheren Temperaturbereich wurde der innere Angriff durch Legierungsverbrauch infolge Verdampfung begleitet. Wenn die Geschwindigkeit der inneren Chlorierung gleich der Geschwindigkeit des Gesamtmetallverbrauches war, näherte sich die Tiefe der inneren Chlorierungszone einem stationären Wert. Bei hohen Temperaturen, bei denen die Verdampfung dominierte, war die stationäre Tiefe der inneren Chlorierung sogar kleiner als bei niedrigeren Temperaturen. Wenn eine Probe nur geringer Verdampfung ausgesetzt war, zeigte sie mehr inneren Angriff als bei stärkerer Verdampfung und umgekehrt.
    Notes: The kinetics of internal chlorination of Ni-based alloys between 400°C and 700°C were investigated by optical and scanning electron microscopy. Internal chlorination of Ni-4Cr and Ni-4Cr-0.5Ce alloy occurred by formation of solid precipitates such as CrCl2, and CeCl3 which are thermodynamically stable and have low vapor pressures at the temperatures within the alloy matrix. In the lower temperature range, the kinetics of internal chlorination nearly followed a parabolic rate law. The degree of internal chlorination increased with increasing temperature. In the higher temperature range, the internal attack was accompanied by the consumption of the alloy by volatilization. When the rate of internal chlorination equaled the rate of overall metal consumption, the depth of the internal chlorination zone would approach a steady state value. At high temperatures, where vaporization was predominant, the steady state depth of internal attack was even smaller than that at lower temperature. When an alloy specimen was subject to little volatilization, it showed more internal attack than when it was not, and vice versa.
    Additional Material: 9 Ill.
    Type of Medium: Electronic Resource
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