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  • 1
    Electronic Resource
    Electronic Resource
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 12 (1972), S. 109-111 
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: A new method for removal of thin films of photoresist polymers has been found. When polymeric films are exposed to ultraviolet light in the presence of air, the material can be removed leaving an extremely clean surface, free of carbonaceous material. This process has been examined for a variety of photoresist polymers as well as on nonphotoresist polymers and on a variety of substrates. The process offers a new method of photoresist removal.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    Electronic Resource
    Electronic Resource
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 12 (1972), S. 209-212 
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Polymeric films deposited from the vapor of C4Cl6 by the surface-photopolymerization technique are electrically and mechanically continuous on various substrates when very thin. The thickness of the films depends upon irradiation time with wavelengths in the region 2000-3000Å. Re-irradiation in oxygen (air) of the polymeric films with light of these low wavelengths leads to patterned removal of the films. Since films 500Å thick and less can resist etchants for various substrates, a new and extremely thin positive photoresist system is possible. Resolution of etched substrates to lines a few microns wide has been demonstrated. If the polymeric films from C4Cl6 are deposited from the monomeric vapor at lower substrate temperatures they are soluble in various solvents. Re-irradiation with UV light with the films in vacuum produces a patterned fixing of the polymer with respect to acetone. A negative photoresist system is therefore possible. Again, films of thickness 500Å and less can resist various etchants such that substrates can be etched to high resolution.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 3
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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