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  • 1
    ISSN: 0142-2421
    Keywords: RCA clean ; glass ; surface chemistry ; polysilicon ; thin film transistor ; ToF-SIMS ; XPS ; x-ray photoelectron spectroscopy ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The surface chemistry of an alkaline-earth boroaluminosilicate glass is changed by contact with chemical solutions. The present study shows that RCA cleaning creates a silica-rich surface on the glass. This altered surface can be removed by hydrofluoric acid etching. During the RCA cleaning process, glass components can be transferred to a polysilicon film placed in the same alkaline solution. The acidic solution in turn removes most of the contamination from the polysilicon. © 1998 John Wiley & Sons, Ltd.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    New York, NY : Wiley-Blackwell
    International Journal of Chemical Kinetics 10 (1978), S. 427-431 
    ISSN: 0538-8066
    Keywords: Chemistry ; Physical Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Notes: HCO radical at a concentration of about 1014 cm-3 is produced by monochromatic laser photolysis of H2CO with a 0.6 mJ frequency-doubled, flashlamp-pumped dye laser pulse. Intracavity dye laser spectroscopy quantitatively monitors HCO absorbance near 614 nm as a function of delay time between photolysis and probing pulses. Rate constants for HCO + O2 and HCO + NO are found to be 4.0 ± 0.8 × 10-12 and 1.45 ± 0.2 × 10-11 cm3 molecule-1 sec-1.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
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