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  • Chemistry  (1)
  • 1
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Acta Polymerica 42 (1991), S. 371-374 
    ISSN: 0323-7648
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: XPS investigations and determination of the electron beam sensitivity revealed a crosslinking mechanism via halogen elimination. The crosslinking effect is higher with an admixture of bisazide. The halogen elimination induced by irradiation of the 4-halogenphenol novolac resists increases in the order fluorine, chlorine, bromine, iodine.
    Notes: XPS-Untersuchungen und die Bestimmung der Elektronenstrahlempfindlichkeit an Halogenphenolnovolak-Resistschichten ergaben, daß ein Vernetzungsmechanismus über Halogeneliminierung abläuft. Durch Bisazidzusatz wird der Vernetzungseffekt erhöht. Die strahlenchemisch induzierte Halogeneliminierung der untersuchten 4-Halogenphenolnovolake steigt in der Reihenfolge Fluor-Chlor-Brom-Iod.
    Additional Material: 9 Ill.
    Type of Medium: Electronic Resource
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