ISSN:
1042-7147
Keywords:
Iodonium salt
;
Photogenerated acid
;
Photoresist
;
Poly(methacrylates)
;
Diffraction efficiency
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Acid-labile polymers of methacrylates of 2-(p-substituted phenyl)propanol-2 and bis(p-methoxyphenyl)methanol were evaluated as visible light sensitive positive-type resists. The chemistry to form images is based on the cleavage of esters catalysed by an acid generated by photodecomposition of diphenyliodonium hexafluorophosphate sensitized by 2-benzoyl-3-(p-dimethylaminophenyl)-2-propenenitrile. A copolymer of bis(p-methoxyphenyl)methyl methacrylate-phenyl methacrylate exhibited a high photospeed upon exposure to 488 nm light when coupled with the iodonium salt and the dye, and was applicable to relief holography.
Additional Material:
4 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pat.1992.220030203
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