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  • Industrial Chemistry  (1)
  • PACS: 61.16.-d Electron, ion, and scanning probe microscopy – 61.46.+w Clusters, nanoparticles, and nanocrystalline materials – 81.05.-t Specific materials: fabrication, treatment, testing and analysis  (1)
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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    The European physical journal 9 (1999), S. 137-140 
    ISSN: 1434-6079
    Keywords: PACS: 61.16.-d Electron, ion, and scanning probe microscopy – 61.46.+w Clusters, nanoparticles, and nanocrystalline materials – 81.05.-t Specific materials: fabrication, treatment, testing and analysis
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract. We used laser-induced decomposition of silane for the fabrication of nanosized Si particles and studied in detail their structural characteristics by conventional and high resolution electron microscopy. The silane gas flow reactor incorporated in a molecular beam apparatus was operated without size selection to achieve a broad size distribution. Deposition at low energy on carbon substrates yielded single crystalline, spherical Si particles almost completely free of planar lattice defects. The particles, covered by thin amorphous oxide shells, are not agglomerated into larger aggregates. The lattice of diamond cubic type exhibits deviations from the bulk spacing which vary from distinct contraction to dilatation as with decreasing particle size the oxide shell thickness is reduced. This effect is discussed in terms of the strong Si/oxide interfacial interaction and compressive stresses arising upon oxidation. A negative interface stress, as determined from the size dependence of the lattice spacing, limits the curvature of the interface, i.e., at small sizes Si oxidation must be considered as a self-limiting process.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Chemie Ingenieur Technik - CIT 40 (1968), S. 61-64 
    ISSN: 0009-286X
    Keywords: Chemistry ; Industrial Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Notes: Es wurde eine Apparatur zur kontinuierlichen Bestimmung der NO2- bzw. (NO + NO2)-Konzentration in Gasströmen chemischer Produktionsanlagen entwickelt. Zur direkten NO2-Messung dient ein für den Betrieb geeignetes Photometer. Um die Summenkonzentration von NO und NO2 zu ermitteln, wird NO durch J2O5 bei 110 °C zu NO2 oxidiert und die gesamte NO2-Menge bestimmt. Da die Bestimmung des Oxidationsgrades im Bereich hoher Konzentrationen an nitrosen Gasen außergewöhnliche Schwierigkeiten bereitet, wurde ein Verdünnungsverfahren entwickelt. Die beschriebene Apparatur wurde an einer Salpetersäure-Absorptionsanlage erprobt.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
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