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Fabrication of magnetic nanostructures by direct laser interference lithography on supersaturated metal mixtures (1999)

Tselev, A.E. ; Polushkin, N.I. ; Verevkin, Y.K. ; [et al.]

Springer

Applied physics 69 (1999), S. S819

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ISSN: 1432-0630

Keywords: PACS: 81.40.Gh; 75.70.Ak; 81.15.Fg

Source: Springer Online Journal Archives 1860-2000

Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics

Notes: Abstract. We present the formation of magnetic nanostructures through the annealing of PLD-deposited Fe-Cr and Co-Ag thin film mixtures by the interference of pulsed laser beams. Both these materials systems have a large miscibility gap under equilibrium conditions. The structures obtained were studied with atomic force and magnetic force microscopy. A pattern of magnetic dots was successfully fabricated on the Fe-Cr sample, but attempts to produce a similar pattern on the Co-Ag film were unsuccessful. The conclusion is drawn that the observed transformations of the film materials under laser heat treatment took place through a local melting of the film in the maxima of the interference pattern. The magnetic properties of the resulting structure are considered to be defined by the liquid state miscibility of the film components.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/s003390051538

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A modified plasma source for controlled layer thickness synthesis in laser pulse vapour deposition (LPVD) (1993)

Dietsch, R. ; Mai, H. ; Pompe, W. ; [et al.]

New York, NY [u.a.] : Wiley-Blackwell

Advanced Materials for Optics and Electronics 2 (1993), S. 19-29

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ISSN: 1057-9257

Keywords: Thin films ; Laser ablation ; X-ray mirrors ; Plasma sources ; UHV deposition equipment ; Ni/C multilayer structures ; SNMS depth profiling ; TEM cross-section ; Chemistry ; Polymer and Materials Science

Source: Wiley InterScience Backfile Collection 1832-2000

Topics: Electrical Engineering, Measurement and Control Technology , Physics

Notes: The conventional thin film deposition equipment of LPVD has been modified for the preparation of nanometre-layer stacks of uniform thickness at reduced target/substrate separation. Therefore the planar target was replaced by a cylindrical one and the target motion regime has been modified.During thin film deposition a substrate translation is preferred instead of the usual rotation technique. With this arrangement the emission characteristic of the plasma source can be computer controlled and tailored via a stepper-motor-driven manipulator for the desired layer thickness profile across an extended substrate. Thus, for example, a homogeneous film thickness is obtained even for lower target/substrate distances, and an appropriate deposition rate can be maintained.First applications of the equipment are explained and compared with typical results of the conventional technique.

Additional Material: 11 Ill.