ISSN:
1572-8978
Keywords:
Plasma
;
polymer etching
;
in situ detection
;
PET and acrylic coating
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Technology
Notes:
Abstract Residual gas analysis (RGA) and optical emission spectroscopy have been evaluated as potential in situ techniques for the detection of plasma-induced polymer surface etching. The detection is based on the measurement of CO and CO2 species formed in the gas phase following oxidation of the etching fragments released from the polymer surface. Experiments were performed on poly(ethylene terephthalate) and UV-cured acrylic (tripropylene glycol diacrylate) films exposed to O2 RF (13.56 MHz) plasmas. A linear correlation is obtained between the formation of CO and the polymer etching rate over the entire experimental range, but discrepancies appear for the formation of CO2 at high treatment powers (etching rate 〉 1.0 μg/min.cm2). This behavior is attributed to a deficit of oxidizing agents relative to the generation of etching fragments. The results suggest that both RGA and optical emission spectroscopy can be used to monitor in situ and in real-time the etching of polymer surfaces during plasma treatment.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1023/A:1021875310148
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