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  • 1
    Electronic Resource
    Electronic Resource
    Positive working photoresists sensitive to visible light, II: poly{2-arylpropyl-2 and bis(p-methoxyphenyl)methyl methacrylates} (1992)
    New York, NY : Wiley-Blackwell
    Polymers for Advanced Technologies 3 (1992), S. 61-65 
    Details
    ISSN: 1042-7147
    Keywords: Iodonium salt ; Photogenerated acid ; Photoresist ; Poly(methacrylates) ; Diffraction efficiency ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Acid-labile polymers of methacrylates of 2-(p-substituted phenyl)propanol-2 and bis(p-methoxyphenyl)methanol were evaluated as visible light sensitive positive-type resists. The chemistry to form images is based on the cleavage of esters catalysed by an acid generated by photodecomposition of diphenyliodonium hexafluorophosphate sensitized by 2-benzoyl-3-(p-dimethylaminophenyl)-2-propenenitrile. A copolymer of bis(p-methoxyphenyl)methyl methacrylate-phenyl methacrylate exhibited a high photospeed upon exposure to 488 nm light when coupled with the iodonium salt and the dye, and was applicable to relief holography.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pat.1992.220030203
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  • 2
    Electronic Resource
    Electronic Resource
    Photosensitive poly(vinyl alcohol) bearing N-(1-pyridinio)benzamidate groups (1993)
    New York, NY : Wiley-Blackwell
    Polymers for Advanced Technologies 4 (1993), S. 514-518 
    Details
    ISSN: 1042-7147
    Keywords: Poly(vinyl alcohol) ; Pyridinium ylide ; Pyridiniobenzamidate ; Negative photoresist ; Photosensitive ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Poly(vinyl alcohol) (PVA) bearing N-(1-pyridinio)benzamidate (PB) was synthesized through acetalization of PVA and 4-dimethoxymethyl-N-(1-pyridinio)benzamidate (DMPB) in water. The PB groups in PVA-PB had almost the same proportion of DMPB to the starting PVA. The UV spectrum of PVA-PB shows an absorption band of pyridinium ylide as a shoulder around 300 nm in water, and as a maximum at 315 nm in a film on a quartz plate. These absorption bands decreased on irradiation at 313 nm. The photoreaction of the PVA-PB film proceeds much faster than that of PVA-PB in water. The solution, of PVA-bearing high-PB content, became slightly turbid during irradiation. After irradiation the film became insoluble in water, and the soluble fraction of polymer (P̄ = 1700) was 3% at a PB content of 1 mol% and less than 1% at that of more than 2 mol%. This polymer can be applied as a water-soluble negative photoresist.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pat.1993.220040806
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    Positive working resists sensitive to visible light, I: poly(tert-butyl and 2-phenylpropyl-2 methacrylates) sensitized with diphenyliodonium salt  -  p-aminobenzylidene dye system (1992)
    New York, NY : Wiley-Blackwell
    Polymers for Advanced Technologies 3 (1992), S. 9-16 
    Details
    ISSN: 1042-7147
    Keywords: Iodonium salt ; Sensitized photolysis ; Photogenerated acid ; Poly(methacrylates) ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Visible-light-sensitive positive type resists have been developed. The chemistry to form images is based on the cleavage of side chain ester bonds of poly(methacrylates) catalyzed by an acid which is generated on sensitized photodecomposition of a diphenyliodonium (DPI) salt. Homopolymers and copolymers of tert-butyl methacrylate (BMA) and 2-phenylpropyl-2 methacrylate (PPMA) were used as acid labile polymers. Exposure of thin films of the poly(methacrylates) containing DPI salt and p-dimethylaminobenzylidene derivatives to an Ar laser beam emitting 488 nm light and subsequent heat treatment resulted in solubility alteration of the polymers, which became soluble in a protic solvent system. Considerable reduction of film thickness was observed after heating an image-wise exposed thin film of PPMA polymers. The minimum exposure energies of 488 nm light for the positive image formation were 60 mJ/cm2 and 40 mJ/cm2 for BMA and PPMA homopolymers, respectively.
    Additional Material: 12 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pat.1992.220030102
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
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