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  • Polymer and Materials Science  (10)
  • Surface analysis  (2)
  • Dewar-anthraquinone  (1)
Materialart
Erscheinungszeitraum
  • 1
    Digitale Medien
    Digitale Medien
    Amsterdam : Elsevier
    Tetrahedron Letters 33 (1992), S. 953-956 
    ISSN: 0040-4039
    Schlagwort(e): Cyclophaneanthraquinone ; Dewar-anthraquinone ; Photochromism ; Photovalence isomerization
    Quelle: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Thema: Chemie und Pharmazie
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 2
    Digitale Medien
    Digitale Medien
    Springer
    Applied physics 6 (1975), S. 241-248 
    ISSN: 1432-0630
    Schlagwort(e): Surface analysis ; SIMS
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Maschinenbau , Physik
    Notizen: Abstract The atomic mixing in the target under ion bombardment is assumed to result from cascades of atomic collision events. Computer simulations have been applied to collision cascades to estimate the depth resolution of surface analysis with an ion probe. The Monte Carlo method based on a single scattering model has been used mainly in the calculation under the assumptions of random collision process, no diffusion and no target saturation processes. High-energy collisions are characterized by a Lenz-Jensen or a Thomas-Fermi potential, while a Born-Mayer potential is used in the low energy region. The simulations have been performed for the bombardment of Ar ions withE 0=5 keV and 10 keV at angles of incidence θ=0° and 60° on Si targets. The depth resolutions [the definition of which is explained by (15) in the text] are about 140Å for the Lenz-Jensen cross section and about 80Å for the Thomas-Fermi one for θ=0° atE 0=5 keV, and decrease by 20–40% at θ=60° and increase by 70–90% forE 0=10 keV.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 3
    Digitale Medien
    Digitale Medien
    Springer
    Applied physics 6 (1975), S. 277-279 
    ISSN: 1432-0630
    Schlagwort(e): Surface analysis ; SIMS
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Maschinenbau , Physik
    Notizen: Abstract The atomic mixing due to a knock-on cascade has much influence on the depth resolution of ion probe microanalysis. The preliminary experimental results support the assumption that the depth resolution due to this effect is determined by the competition of sputtering rate and creation rate of atomic displacement.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 4
    Digitale Medien
    Digitale Medien
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 12 (1988), S. 161-161 
    ISSN: 0142-2421
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Physik
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 5
    Digitale Medien
    Digitale Medien
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 16 (1990), S. 140-143 
    ISSN: 0142-2421
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Physik
    Notizen: The Japanese VAMAS-SCA working group is composed of 19 institutes. Three kind of Au—Cu alloys (Au 75 at.-%-Cu 25 at.-%, Au 50 at.-%-Cu 50 at.-%, Au 25 at.-%-Cu 75 at.-%) were prepared, and these specimens, pure Au and pure Cu were distributed to the members of the VAMAS-SCA working group. The surface concentrations of these alloys were calculated from the Auger peak amplitudes in two ways. One method used the published relative sensitivity factors, and the other used pure Au and Pure Cu as the standard materials. The mean values of the surface concentrations calculated with the published relative sensitivity factors were almost the same as those calculated with the standard materials. This means that the published relative sensitivity factors are reliable to some extent. The error of the surface concentration calculated with pure Au and pure Cu as the standard materials lay between about 3% and 10%, and that with the relative sensitivity factors lay between about 7% and 20%. The calculated surface concentrations of Au were larger than the bulk concentrations of Au when the matrix effect was neglected.
    Zusätzliches Material: 7 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 6
    Digitale Medien
    Digitale Medien
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 21 (1994), S. 615-620 
    ISSN: 0142-2421
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Physik
    Notizen: A status report is given on activities of ISO Technical Committee 201 (ISO/TC 201) on Surface Chemical Analysis. The committee has seven subcommittees which met for the first time in 1993. Information is given on the working groups that have been established for specific purposes. We show national participation in ISO/TC 201 and its subcommittees, and we identify the chairmen and secretariats of the subcommittees and the conveners of the working groups.
    Zusätzliches Material: 10 Tab.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 7
    Digitale Medien
    Digitale Medien
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 23 (1995), S. 351-362 
    ISSN: 0142-2421
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Physik
    Notizen: We have studied the effect of elastic scattering and analyser geometry on calculations of electron escape depths. A theoretical analysis of the electron escape depth has been presented that shows how it is related to the solid angle for detection and the geometrical configuration of a cylindrical mirror analyser. To estimate the extent to which elastic scattering can modify the values of the escape depth, Monte Carlo simulations of the emission of Auger electrons were carried out for Cu MVV (59 eV), Cu LMM (916 eV), Au NVV (238 eV) and Au MNN (2025 eV) signals. From the calculated depth distributions of signal electrons, we have derived a correction factor for the electron escape depth in terms of the corresponding inelastic mean free path which includes both the effects of elastic scattering and analyser geometry. We have found that elastic scattering reduces the value of the escape depth by several tens of per cent and, depending on the target, signal electron energy and analyser geometry, the ration between the escape depth and the inelastic mean free path varies from 0.4 to 0.6.
    Zusätzliches Material: 9 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 8
    ISSN: 0142-2421
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Physik
    Notizen: The Japanese VAMAS-SCA working group is composed of 19 institutes. Three kinds of Au-Cu alloys (Au25 at%-Cu75 at%, Au50 at%-Cu50 at%, Au75 at%-Cu25 at%) were prepared, and these specimens were distributed to the members of Japanese VAMAS-SCA working group and Auger peak amplitude ratios were measured to clarify the correlation factor of different types of spectrometers. The comparison was carried out by using the relative sensitivity factor for Au and Cu. The relative sensitivity factor for lower energy varied from spectrometer to spectrometer, but that for higher energy did not vary so much. Therefore, to carry out the inter-laboratory comparison of the data, the transfer of the data of peak amplitude at higher energy should be recommended.
    Zusätzliches Material: 5 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 9
    Digitale Medien
    Digitale Medien
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 20 (1993), S. 322-325 
    ISSN: 0142-2421
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Physik
    Notizen: The International Organization of Standardization (ISO) recently created a new Technical Comittee (ISO/TC 201) on Surface Chemical Analysis in response to a proposal from Japan. As of February 1993, ten national standards bodies had indicated willingness to become participating members of ISO/TC 201 (Austria, China, Germany, Italy, Japan, Russia, Sweden, Turkey, the United Kingdom and the United States of America) and fifteen national standards bodies had indicated willingness to become observer members (Australia, Belgium, Egypt, Finland, France, India, Ireland, Korea, Norway, Philippines, Poland, Romania, Singapore, South Africa and Switzerland). The following subcommittees are planned: Terminology; General Procedures; Data Management and Treatment; Depth Profiling; Auger Electron Spectroscopy; Secondary Ion Mass Spectrometry and X-ray Photoelectron Spectroscopy. It is expected that working groups will be established for Glow Discharge Optical Spectroscopy and Total Reflection X-ray Fluorescence Spectroscopy. ISO/TC 201 will develop international standards and will consider standards and documents prepared by other groups as potential international standards. Information is given in this article on the purpose, structure and planned work of ISO/TC 201.
    Zusätzliches Material: 3 Tab.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 10
    ISSN: 0142-2421
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Physik
    Notizen: The simulation of electron/solid interactions is discussed, with emphasis on its applicability to the matrix correction in quantitative analysis by AES, and to its potential use in background substraction in AES. The Monte Carlo calculation models are first explained, which have been improved to allow the estimation of (i) back-scattering correction factors, and (ii) energy profiles of back-scattered electrons in the high-energy region (i.e. elastically-scattered electrons and the characteristic loss structures) and the slow secondary region. For this purpose, a dielectric approach is used for the treatment of the electron inelastic scattering in the solid. Then, the models are applied to samples with bi-layer structures, and the change of Si Auger signals observed during sputter-etching of a sample consisting of a Si thin film (7000 Å) on a W substrate is well explained. Changes in the energy distributions of back-scattered electrons during the formation of very thin (5 to 100 Å) Cu films on a Si substrate are also estimated by the Monte Carlo calculation, together with the shapes of the elastic peak and the characteristic loss peaks.
    Zusätzliches Material: 9 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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