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  • Polymer and Materials Science  (3)
  • 1
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 24 (1996), S. 856-862 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The samples for this analysis are hard steel machine elements. They have been treated with boron as an additive of the lubricant during part of the contact process in a tribological test rig, in order to create wear resistant surfaces. After the tribological procedure the surfaces are examined for their in-depth concentration profiles of oxygen, carbon, sulphur, iron and boron. This analysis is done with SIMS, using positively charged O2 and Cs ion beams for erosion, and controlled 11B implantation in the base material for calibration of sputter depth and boron concentration. For the present samples the native surface oxide concentration profile is found to enhance the signals considerably at the beginning of the SIMS measurements. This effect is discussed and tentatively corrected for through the observed 12C profiles. Comparison with TRIM-simulated profiles for the implanted samples shows that the suggested correction procedure clearly improves the results for the boron profiles. It therefore becomes possible to quantify the shallow boron concentration profiles and to relate them to the tribological properties of the surfaces.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 16 (1990), S. 199-202 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: We present an analysis of the critical factors for the determination of surface concentrations from derivative Auger spectra. A new spectroscopic quantity, Pσ2, should supersede the peak-to-peak signal. This quantity is the product of the negative-peak-to-background value, P, multiplied by the square of the width of the peak, σ. The method is applied here to Si and C in an SiC sample, but will apply to any multicomponent system. The analysis needs the derivative Auger spectra of the clean components and the sample in question. We also examine relevant changes in material properties between the reference materials and the SiC sample, as several properties of the Si—C—SiC system vary owing to large differences in atomic densities for the three materials. In this system, lineshapes, back-scattering of primary electrons and inelastic mean free paths vary for the Auger electrons. Our analysis shows that the lineshape changes could induce errors in directly derived, uncorrected concentrations by factor of 2 (for SiC), while the two other corrections are on the 10% level. With the present method, an Ar ion bombarded surface of SiC shows only a slight enrichment of C, which is much less pronounced than without the corrections.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Factor analysis is applied to d(NE)/dE Auger electron spectra of a series of AuCu alloys (25% Au, 50% Au and 75% Au), including in the analysis the spectra of clean Au and Cu surfaces. Surface quantitation is obtained from the low-energy Au NOO and Cu LMM spectra of the alloys. The overlap of these spectra is resolved with factor analysis. An accuracy of the derived, relative surface concentrations of 1:100 is possible with this method, with a similar sensitivity to changes in surface composition. During Ar+ ion bombardment the surfaces of 25% and 50% Au alloys show no difference from the bulk concentrations, within ±1:100, from 1 to 3 keV Ar+ ion energy. For the 75% Au alloy, a slight Au enrichment is produced, when the energy increases from 1 to 3 keV. However, at 500 eV Ar+ ion energy, the surfaces become strongly enriched in Au, probably due to threshold effects for Au. Thus, no evidence for such strongly varying processes are found in molecular dynamics simulations of the mass effect in the sputtering process from a 50%:50% alloy. Factor analysis is also used to detect the presence of chemically affected spectral features during oxygen exposure at room temperature of the alloys and of pure Cu. Oxidation of the copper component is observed, producing at saturation a cuprous oxide with a total copper enrichment of the surface.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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