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  • 1
    Electronic Resource
    Electronic Resource
    Effect of elastic scattering and cylindrical mirror analyser geometry on the evaluation of escape depths of auger electrons (1995)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 23 (1995), S. 351-362 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: We have studied the effect of elastic scattering and analyser geometry on calculations of electron escape depths. A theoretical analysis of the electron escape depth has been presented that shows how it is related to the solid angle for detection and the geometrical configuration of a cylindrical mirror analyser. To estimate the extent to which elastic scattering can modify the values of the escape depth, Monte Carlo simulations of the emission of Auger electrons were carried out for Cu MVV (59 eV), Cu LMM (916 eV), Au NVV (238 eV) and Au MNN (2025 eV) signals. From the calculated depth distributions of signal electrons, we have derived a correction factor for the electron escape depth in terms of the corresponding inelastic mean free path which includes both the effects of elastic scattering and analyser geometry. We have found that elastic scattering reduces the value of the escape depth by several tens of per cent and, depending on the target, signal electron energy and analyser geometry, the ration between the escape depth and the inelastic mean free path varies from 0.4 to 0.6.
    Additional Material: 9 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740230603
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  • 2
    Electronic Resource
    Electronic Resource
    Activities of ISO technical committee 201 on surface chemical analysis (1994)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 21 (1994), S. 615-620 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A status report is given on activities of ISO Technical Committee 201 (ISO/TC 201) on Surface Chemical Analysis. The committee has seven subcommittees which met for the first time in 1993. Information is given on the working groups that have been established for specific purposes. We show national participation in ISO/TC 201 and its subcommittees, and we identify the chairmen and secretariats of the subcommittees and the conveners of the working groups.
    Additional Material: 10 Tab.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740210904
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  • 3
    Electronic Resource
    Electronic Resource
    Formation of Technical Committee 201 on Surface Chemical Analysis by the International Organization for Standardization (1993)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 20 (1993), S. 322-325 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The International Organization of Standardization (ISO) recently created a new Technical Comittee (ISO/TC 201) on Surface Chemical Analysis in response to a proposal from Japan. As of February 1993, ten national standards bodies had indicated willingness to become participating members of ISO/TC 201 (Austria, China, Germany, Italy, Japan, Russia, Sweden, Turkey, the United Kingdom and the United States of America) and fifteen national standards bodies had indicated willingness to become observer members (Australia, Belgium, Egypt, Finland, France, India, Ireland, Korea, Norway, Philippines, Poland, Romania, Singapore, South Africa and Switzerland). The following subcommittees are planned: Terminology; General Procedures; Data Management and Treatment; Depth Profiling; Auger Electron Spectroscopy; Secondary Ion Mass Spectrometry and X-ray Photoelectron Spectroscopy. It is expected that working groups will be established for Glow Discharge Optical Spectroscopy and Total Reflection X-ray Fluorescence Spectroscopy. ISO/TC 201 will develop international standards and will consider standards and documents prepared by other groups as potential international standards. Information is given in this article on the purpose, structure and planned work of ISO/TC 201.
    Additional Material: 3 Tab.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740200410
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  • 4
    Electronic Resource
    Electronic Resource
    Development of standards for surface analysis by ISO technical committee 201 on surface chemical analysis (1997)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 25 (1997), S. 860-868 
    Details
    ISSN: 0142-2421
    Keywords: ISO/TC 201 on Surface Chemical Analysis ; standards ; surface analysis ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A summary is given of the organization and work of Technical Committee 201 on Surface Chemical Analysis of the International Organization for Standardization (ISO). Twelve potential international standards are currently in various stages of development and a further thirteen standards are expected to be developed shortly. Information is also given on expected future needs for standards with examples from a recent survey of experts in Auger electron spectroscopy and x-ray photoelectron spectroscopy. © 1997 John Wiley & Sons, Ltd.
    Additional Material: 14 Tab.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    The reliability of quantitative analysis with AES (1990)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 16 (1990), S. 140-143 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The Japanese VAMAS-SCA working group is composed of 19 institutes. Three kind of Au—Cu alloys (Au 75 at.-%-Cu 25 at.-%, Au 50 at.-%-Cu 50 at.-%, Au 25 at.-%-Cu 75 at.-%) were prepared, and these specimens, pure Au and pure Cu were distributed to the members of the VAMAS-SCA working group. The surface concentrations of these alloys were calculated from the Auger peak amplitudes in two ways. One method used the published relative sensitivity factors, and the other used pure Au and Pure Cu as the standard materials. The mean values of the surface concentrations calculated with the published relative sensitivity factors were almost the same as those calculated with the standard materials. This means that the published relative sensitivity factors are reliable to some extent. The error of the surface concentration calculated with pure Au and pure Cu as the standard materials lay between about 3% and 10%, and that with the relative sensitivity factors lay between about 7% and 20%. The calculated surface concentrations of Au were larger than the bulk concentrations of Au when the matrix effect was neglected.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740160127
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  • 6
    Electronic Resource
    Electronic Resource
    Quantitative surface chemical analysis of Au—Cu alloys with aes (1988)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 12 (1988), S. 125-130 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The Japanese VAMAS-SCA working group is composed of 19 institutes. Three kinds of Au-Cu alloys (Au25 at%-Cu75 at%, Au50 at%-Cu50 at%, Au75 at%-Cu25 at%) were prepared, and these specimens were distributed to the members of Japanese VAMAS-SCA working group and Auger peak amplitude ratios were measured to clarify the correlation factor of different types of spectrometers. The comparison was carried out by using the relative sensitivity factor for Au and Cu. The relative sensitivity factor for lower energy varied from spectrometer to spectrometer, but that for higher energy did not vary so much. Therefore, to carry out the inter-laboratory comparison of the data, the transfer of the data of peak amplitude at higher energy should be recommended.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740120212
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  • 7
    Electronic Resource
    Electronic Resource
    Simulation of electron/solid interaction and application to quantitative analysis by electron spectroscopies (1988)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 12 (1988), S. 161-161 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740120218
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  • 8
    Electronic Resource
    Electronic Resource
    Simulation of electron/solid interaction and its application to quantitative analysis by Auger electron spectroscopyInvited paper presented at ECASIA 87, 19-23 October 1987, Fellbach, near Stuttgart, FRG. (1988)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 13 (1988), S. 149-159 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The simulation of electron/solid interactions is discussed, with emphasis on its applicability to the matrix correction in quantitative analysis by AES, and to its potential use in background substraction in AES. The Monte Carlo calculation models are first explained, which have been improved to allow the estimation of (i) back-scattering correction factors, and (ii) energy profiles of back-scattered electrons in the high-energy region (i.e. elastically-scattered electrons and the characteristic loss structures) and the slow secondary region. For this purpose, a dielectric approach is used for the treatment of the electron inelastic scattering in the solid. Then, the models are applied to samples with bi-layer structures, and the change of Si Auger signals observed during sputter-etching of a sample consisting of a Si thin film (7000 Å) on a W substrate is well explained. Changes in the energy distributions of back-scattered electrons during the formation of very thin (5 to 100 Å) Cu films on a Si substrate are also estimated by the Monte Carlo calculation, together with the shapes of the elastic peak and the characteristic loss peaks.
    Additional Material: 9 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740130207
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  • 9
    Electronic Resource
    Electronic Resource
    Evaluation of correction accuracy of several schemes for AES matrix effect correctionsPaper presented at ECASIA 89, Antibes, France, 23-27 October 1989. (1990)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 15 (1990), S. 466-472 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A matrix effect correction is required to improve the accuracy of quantitative AES analysis. The correction includes terms involving the atomic density (n), electron back-scattering factor (R) and electron escape depth (L). Many schemes have been proposed by various people for corrections of the R and L terms. However, up to now, there have been no systematic investigations of the correction accuracy of the proposed schemes. We have evaluated the correction accuracy, based on measured intensity data for Au—Cu alloys of different compositions. Comparison was made between the observed intensity ratio K (=Iunk/Istd) and the calculated intensity, ratio K′ (= C(nunk/nstd)(Runk/Rstd)(Lunk/Lstd)), where C and I represent the concentration and intensity, respectively. The superscripts ‘unk’ and ‘std’ denote that the parameters are for unknown and standard specimens, here the pure elements. If the correction works well, the error Er (= K′ — K)/(K) will become smaller. Evaluations were carried out on three schemes for the R correction and on seven schemes for the L correction using the Au 239 eV, Au 2024 eV and Cu 920 eV transitions. The root mean square (RMS) of the calculated errors showed several per cent for the best case and 20-30% for the worst case. The RMS error varied a few per cent between schemes for the R correction but it varied ∼30% for the L correction.
    Additional Material: 9 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740150805
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  • 10
    Electronic Resource
    Electronic Resource
    Surface composition analyses of Co-Ni alloys under Ar+ ion bombardment by AES and ISS: A possible standard sample for surface chemical analysis (1989)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 14 (1989), S. 388-392 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The change in surface composition of Co(50.4 at.%)-Ni alloy under Ar+ ion bombardment was investigated by Auger electron spectroscopy (AES) and ion scattering spectroscopy (ISS). The surface concentrations were estimated by employing a spectrum synthesis method, since the Co and Ni signals in both AES and ISS spectra overlap each other. The results based on the quantifications by AES and ISS have indicated that the composition of the Co-Ni alloy surface under Ar+ ion bombardment is the same as the bulk composition within the accuracy in quantification, leading to the conclusion that ion bombardment does not cause surface composition change in the Co-Ni alloy. This supports the proposal that the Co-Ni alloy system is an appropriate reference material for surface chemical analysis.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740140616
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