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  • Surface analysis  (2)
  • 79.20  (1)
  • ISO/TC 201 on Surface Chemical Analysis  (1)
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 6 (1975), S. 277-279 
    ISSN: 1432-0630
    Keywords: Surface analysis ; SIMS
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The atomic mixing due to a knock-on cascade has much influence on the depth resolution of ion probe microanalysis. The preliminary experimental results support the assumption that the depth resolution due to this effect is determined by the competition of sputtering rate and creation rate of atomic displacement.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 18 (1979), S. 425-426 
    ISSN: 1432-0630
    Keywords: 79.20
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The statistics of the sputtering process, which has been used to explain sputterbroadening effect due to surface roughness, has been treated with conditional probabilities. This results in the relationship, $${{\Delta z} \mathord{\left/ {\vphantom {{\Delta z} z}} \right. \kern-\nulldelimiterspace} z} \propto \sqrt {(1 + \overline \gamma )/z} $$ , instead of $${{\Delta z} \mathord{\left/ {\vphantom {{\Delta z} z}} \right. \kern-\nulldelimiterspace} z} \propto {1 \mathord{\left/ {\vphantom {1 {\sqrt z }}} \right. \kern-\nulldelimiterspace} {\sqrt z }}$$ derived by S. Hofmann [Appl. Phys.9, 59 (1976)], where δz,z, and $$\overline \gamma $$ are the depth resolution, sputtered depth and sputtering yield, respectively.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 6 (1975), S. 241-248 
    ISSN: 1432-0630
    Keywords: Surface analysis ; SIMS
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The atomic mixing in the target under ion bombardment is assumed to result from cascades of atomic collision events. Computer simulations have been applied to collision cascades to estimate the depth resolution of surface analysis with an ion probe. The Monte Carlo method based on a single scattering model has been used mainly in the calculation under the assumptions of random collision process, no diffusion and no target saturation processes. High-energy collisions are characterized by a Lenz-Jensen or a Thomas-Fermi potential, while a Born-Mayer potential is used in the low energy region. The simulations have been performed for the bombardment of Ar ions withE 0=5 keV and 10 keV at angles of incidence θ=0° and 60° on Si targets. The depth resolutions [the definition of which is explained by (15) in the text] are about 140Å for the Lenz-Jensen cross section and about 80Å for the Thomas-Fermi one for θ=0° atE 0=5 keV, and decrease by 20–40% at θ=60° and increase by 70–90% forE 0=10 keV.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 25 (1997), S. 860-868 
    ISSN: 0142-2421
    Keywords: ISO/TC 201 on Surface Chemical Analysis ; standards ; surface analysis ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A summary is given of the organization and work of Technical Committee 201 on Surface Chemical Analysis of the International Organization for Standardization (ISO). Twelve potential international standards are currently in various stages of development and a further thirteen standards are expected to be developed shortly. Information is also given on expected future needs for standards with examples from a recent survey of experts in Auger electron spectroscopy and x-ray photoelectron spectroscopy. © 1997 John Wiley & Sons, Ltd.
    Additional Material: 14 Tab.
    Type of Medium: Electronic Resource
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