ISSN:
0948-1907
Keywords:
CVD
;
Ion beam
;
Thin films
;
Oxides
;
Nitrides
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
The ion-beam-induced chemical vapor deposition method for the preparation of thin films consists of the bombardment of a suitable substrate with O2⊕ or N2⊕ ions of relatively high energy while a flow of an organometallic precursor is directed onto its surface. Single and mixed oxides and nitride thin films can be prepared by this procedure. This paper describes the principles of the method, and presents some examples of thin films prepared with it (TiO2, PbTiO3, AlxTiyOz, AlN, and SnO2). Some characterization results of these thin films by different techniques are reported, with special emphasis on physical and electronic methods such as X-ray photoelectron spectroscopy (XPS), electron energy loss spectroscopy (EELS), and X-ray absorption spectroscopy (XAS). Other aspects, such as the preferential removal of C, H, and other impurity atoms from the precursors under the action of oxygen beams, or the possibility of performing lithographic depositions of these dielectric materials, are also considered.
Additional Material:
9 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/cvde.19970030410
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