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  • 1
    Electronic Resource
    Electronic Resource
    Measurement of electron densities by a microwave cavity method in 13.56-MHz RF plasmas of Ar, CF4, C2F6, and CHF3 (1991)
    Springer
    Plasma chemistry and plasma processing 11 (1991), S. 357-370 
    Details
    ISSN: 1572-8986
    Keywords: Electron density ; microwave cavity ; fluorocarbon
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Electron densit ies have been determined /or RF plasmas that were generated within a microwave resonant cavity by measuring the difference of the resonance frequencies with and without plasma. Since that method only yields a value of the electron density weighted ouer the microwave electric field distribution, to obtain real values an assumption on the spatial distribution of the electron density had to he made. Spatial profiles were taken of the emission of a 4s–5p Ar line at 419.8 not (with a small Ar admixture). The electron densities have been determined as a function of pressure and RF power in Ar, CF4, C2 F6 and CHF, plasmas. The results indicate that the electron density for the last three gases decreases as a function of pressure above 50 m Torr. Typical values for the electron density for the investigated parameter range are 1–6 · 103 cm−3. Furthermore, the electron density is the lowest in gases with a high attachment cross .section.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01458916
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  • 2
    Electronic Resource
    Electronic Resource
    Fast deposition of amorphous hydrogenated carbon films using a supersonically expanding arc plasma (1990)
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 49-69 
    Details
    ISSN: 1572-8986
    Keywords: Plasma deposition ; amorphous hydrogenated carbon ; supersonic expansion ; cascaded arc ; ellipsometry ; chemical reaction rate equation
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Experiments concerning the growth rate and quality of an amorphous hydrogenated carbon film deposited in a reactor based on the supersonic expansion of an arc plasma are reported. In order to be able to calculate the deposition rate, an existing flow model has been completed with chernical reaction rate equations. The methane gas that is injected in the arc appears to be dissociated and ionized completely. The calculated deposition rates agree well with the experimental values obtained within-situ ellipsometry. The growth rates are an order of magnitude larger than those reported in the literature. Still, the film quality, expressed in terms of refractive index, optical bandgap, and hardness, is similar to those obtained by other authors.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01460447
    Library Location Call Number Volume/Issue/Year Availability
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    Paper (German National Licenses)
    Fulltext
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