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  • 1
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 25 (1997), S. 464-477 
    ISSN: 0142-2421
    Keywords: SIMS ; deconvolution ; depth resolution ; boron ; silicon ; separability ; confidence level ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: In this paper, an iterative algorithm is used in order to deconvolve some real and simulated SIMS profiles of boron-doped layers in silicon.The real SIMS profiles are obtained by the analysis of delta layers of boron-doped silicon in a silicon matrix, analysed in a Cameca IMS3/4f instrument at oblique incidence. It is shown that two layers that are completely convolved by the SIMS experiment can be completely separated. In order to try to solve the problem of reliability of the deconvolution results, a confidence level is defined, which indicates the level below which the deconvolved profile should not be taken into account. Moreover, a parameter defined previously is used to define whether a satisfying solution of the deconvolution problem exists or not. This parameter is applied to the experimental profiles.The simulated profiles are chosen so that they correspond to real cases encountered by the SIMS analysts and clarify what can be expected from the method. Several characteristic features are examined, such as the separability of Gaussian functions or the dynamic range of the deconvolution of rising or falling functions. It is shown that the minimum distance between two delta layers that can be separated using 3.5 keV/O2+ primary beam SIMS analysis at oblique incidence is equal to 60 Å, and that abrupt error functions and exponential functions can be retrieved very satisfactorily. © 1997 John Wiley & Sons, Ltd.
    Additional Material: 14 Ill.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 26 (1998), S. 974-983 
    ISSN: 0142-2421
    Keywords: SIMS ; depth resolution ; deconvolution ; boron ; silicon ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: In this paper, the problem of the deconvolution of SIMS depth profiles is addressed. In particular, the hypotheses that are necessary for the deconvolution to be possible (in the actual state of the art) in the case of the SIMS signal are reviewed. Then, the principle of regularization, which is a mandatory step in the resolution of an ill-posed problem, is clarified. Two regularization methods used in the field of SIMS analysis are compared: Miller regularization and maximum entropy regularization.In a second part the study of a possible deconvolution, using a depth resolution function (DRF) that is not the DRF that has experimentally convolved the profile, is justified and theoretically addressed. Two cases arise: the DRF used in the deconvolution process is either thinner than the experimental DRF or it is thicker. It is shown that deconvolution using a DRF that is wider than the DRF that actually convolved the profile is possible, and must be taken into consideration. Some examples of simulated deconvolutions with a false DRF are given, and some tools are proposed that are theoretically able to detect a problem when the DRF used in the deconvolution process is wider than the real DRF.In the last section, an example of experimental deconvolution shows that the deconvolution process is able to provide reliable information. In particular, deconvolution of a SIMS analysis conducted at 5.5 keV O2+ and 42.4° incidence (in a Cameca IMS 3/4f) reveals some features of the sample that require at least 1 keV O2+ and 60° primary beam incidence to be detected experimentally. © 1998 John Wiley & Sons, Ltd.
    Additional Material: 12 Ill.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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