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  • 1965-1969  (13)
Materialart
Erscheinungszeitraum
Jahr
  • 11
    ISSN: 0021-8995
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Maschinenbau , Physik
    Notizen: Poly(methylene disulfide), poly(methylene tetrasulfide), poly(ethylene disulfide), and poly(ethylene tetrasulfide) have been subjected to ultraviolet radiation in vacuum at 50°C. Weight losses during photolysis include both low molecular weight compounds and readily condensable polymeric materials; the latter account for the greater proportion of the weight losses. Carbon monosulfide, isolated as its polymer, and hydrogen sulfide are major photolytic products. Carbon disulfide is a major product from the methylene but not from the ethylene polymers. The tetrasulfide polymers during irradiation from volatile products which on condensation give the original polymer. A mechanism of degradation compatible with these findings is suggested.
    Zusätzliches Material: 3 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 12
    Digitale Medien
    Digitale Medien
    New York : Wiley-Blackwell
    Journal of Polymer Science Part B: Polymer Letters 4 (1966), S. 771-774 
    ISSN: 0449-2986
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie
    Zusätzliches Material: 1 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 13
    Digitale Medien
    Digitale Medien
    New York : Wiley-Blackwell
    Journal of Polymer Science Part A: General Papers 3 (1965), S. 2303-2311 
    ISSN: 0449-2951
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Physik
    Notizen: Apparent quantum yields for the random scission of poly(α-methylstyrene) in solution by 2537 A. radiation were shown to be solvent-dependent, indicating that processes other than the direct photolysis of the polymer are taking place. Quantum yields on the order of 10-3 scissions per quantum absorbed by the polymer were found in benzene, dioxane, cyclohexane, and methylene chloride and about 0.2 in chloroform and carbon tetrachloride; the quantum yields were unaffected by oxygen. In carbon tetrachloride, the quantum yields decreased slightly with increasing polymer concentration. Ethanol and cyclohexane were inhibitors for the photolysis in carbon tetrachloride, while the latter solvent acted as a sensitizer in cyclohexane. By comparison with model compounds irradiated in carbon tetrachloride, it was shown that an early step in the photolysis of poly(α-methylstyrene) in this solvent involves reaction with a main-chain methylene group and eventual substitution with a trichloromethyl group.
    Zusätzliches Material: 2 Ill.
    Materialart: Digitale Medien
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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