Skip to main content
Log in

Use of thin films to study pore distribution over depth of range of Ar+ ions in nickel

  • Letters
  • Published:
Soviet Atomic Energy Aims and scope

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Literature Cited

  1. V. F. Zelenskii et al., in: Reactor Materials Science, Proc. Conf. on Reactor Materials Science [in Russian], Vol. 2, Izd. TsNIIatominform, Moscow (1978), p. 20.

    Google Scholar 

  2. V. F. Zelenskii et al., in: Reactor Materials Science, Proc. Conf. on Reactor Materials Science [in Russian], Vol. 2, Izd. TsNIIatominform, Moscow (1978), p. 3.

    Google Scholar 

  3. V. V. Gann and O. V. Yudin, in: Problems of Atomic Science and Engineering [in Russian], No. 1 (9), Izd. KhFTI Akad. Nauk UkrSSR, Kharkov (1979), p. 37.

    Google Scholar 

  4. E. Nelson and J. Hudson, J. Nucl. Mater.,58, 11 (1975).

    Google Scholar 

  5. H. Wiedersich, J. Burton, and J. Katz, J. Nucl. Mater.,51, 287 (1977).

    Google Scholar 

  6. V. F. Zelenskii et al., At. Energ.,45, No. 1, 61 (1978).

    Google Scholar 

Download references

Authors

Additional information

Translated from Atomnaya Énergiya, Vol. 48, No. 3, pp. 175–177, March, 1980.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Guglya, A.G., Gusev, V.A., Zelenskii, V.F. et al. Use of thin films to study pore distribution over depth of range of Ar+ ions in nickel. At Energy 48, 197–199 (1980). https://doi.org/10.1007/BF01142151

Download citation

  • Received:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF01142151

Keywords

Navigation