Deposition of high fluorine content macromolecular thin layers under continuous-flow-system corona discharge conditions

Summary

High fluorine content macromolecular layers were deposited on polyethylene (PE) film surfaces under an originally designed, continuos-flow-system plasma reactor conditions. Survey and angle resolution, ESCA data and ATR-FTIR results indicate that the plasma-created films are thin and have a fairly uniform structure. The fluorinated layers have a 60% relative fluorine atomic concentration, and are mainly composed of CF₂-CF, and C-CF₃ groups. AFM images collected from virgin and plasma-exposed PE surfaces show a significantly rougher surface of the plasma-treated substrates. Applications can be envisaged for creating Teflon-like coatings on various polymeric film surfaces using a continuous plasma process.