Abstract
The suitability of local temperature measurements by cw Raman spectroscopy for the CH4/H2 CVD system has been established. The temperature profiles in a model reactor were derived from H2 pure rotational lines and from hot bands of thev 1 vibrational band of CH4. Experimental results are presented for substrate temperatures of 773 K and of 1473 K. High accuracy of measurement and excellent agreement with theoretical solutions for the temperature field within the reactor were found.
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Leyendecker, G., Doppelbauer, J., Bäuerle, D. et al. Raman diagnostics of CVD systems: Determination of local temperatures. Appl. Phys. A 30, 237–243 (1983). https://doi.org/10.1007/BF00614773
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DOI: https://doi.org/10.1007/BF00614773