Abstract
Thin film multilayers of Fe and Al with thicknesses ranging from 10 nm/2 nm to 10 nm/420 nm Fe/Al are used as starting structures to produce intermetallic phases by solid-phase reaction during high-vacuum thermal annealings. By measuring the relative concentrations of the reacting Fe and Al species nearby the growing interfaces and using the recently introduced concept of effective heat of mixing of binary thin-film metallic systems, a method is suggested to predict the phases to be obtained from different combinations of initial multilayer thickness and annealing temperature.
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References
K.N. Tu: Ann. Rev. Mat. Sci. 15, 147 (1985)
U. Gösele, K.N. Tu: J. Appl. Phys. 53, 3252 (1982)
R.W. Ballufi, J.M. Blakely: Thin Solid Films 25, 363 (1975)
P.M. Holl, J.M. Morabito, J.M. Poate: Thin Solid Films 33, 107 (1976)
B.X. Liu: Phys. Stat. Sol. 94, 11 (1986)
D.B. Fraser: In VLSI Technology, ed. by S.M. Sze (McGraw-Hill, New York 1983) p. 347
E.G. Colgan: Mat. Sci. Rep. 5, 1 (1990)
R. Pretorius, A.M. Vredenberg, F.W. Saris, P.M. Reus: J. Appl. Phys. 70, 3636 (1991)
S.R. Teixeira, F.L. Freire, I.J.R. Baumvol: Appl. Phys. A 48, 481 (1989)
A. Csanády, J.R. Günter, P.B. Barna, J. Mayer: Thin Solid Films 167, 203 (1988)
L.R. Doolittle: Nucl. Instr. Meth. B 9, 344 (1985)
C. Jaouen, J.P. Rivière, J. Delafond: Nucl. Instr. Meth. Phys. Res. B 10/20, 549 (1987)
R.S. Preston, R. Gerlach: Phys. Rev. B 3, 1519 (1971)
V.V. Nemoshkalenko, O.N. Rasumov, V.V. Gorskü: Phys. Stat. Sol. 29, 45 (1968)
R.A, Dunlap, D.J. Lloyd, G. Stroink, Z.M. Stadnik: J. Phys. F 18, 1329 (1988)
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Alexandre, J.L., Vasconcellos, M.A.Z., Teixeira, S.R. et al. The formation of intermetallic phases by solid-phase reaction of Fe/Al multilayers. Appl. Phys. A 56, 113–118 (1993). https://doi.org/10.1007/BF00517676
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DOI: https://doi.org/10.1007/BF00517676