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Sputtering of two-phase AgxCux alloys

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Abstract

Elemental sputtering yields from two phase AgCu alloys were measured for 20, 40 and 50 at% Ag. Argon ion bombardment energies were in the range 35–55 keV and the ion dose was 1×1019 ions cm−2. The sputtering yield for silver was found to be considerably below what was expected by simple selective sputtering of a two component alloy. Analysis by electron probe X-ray microanalysis and scanning electron microscopy of the eroded surface indicated that surface diffusion of copper from copper rich grains and geometrical constraints in the dense cone forest on Cu/Ag eutectic regions combine to reduce the sputtering yield for silver.

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Bibić, N., Wilson, I.H., Milosavljević, M. et al. Sputtering of two-phase AgxCux alloys. J Mater Sci 27, 4945–4948 (1992). https://doi.org/10.1007/BF01105258

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  • DOI: https://doi.org/10.1007/BF01105258

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