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Mechanisms and kinetics of the initial stages of growth of films grown by chemical vapor deposition

  • Surfaces, Electron and Ion Emission
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Abstract

The initial stages of growth of films and coatings by chemical vapor deposition are investigated. A system of equations is derived which describes the evolution of an island film at the stage of Ostwald ripening under conditions characteristic of vapor deposition. Solving this system of equations yields the dependence of all of the main characteristics of island films (the size distribution function of the islands, the dependence of the mean radius and density of the islands) as functions of time and the spatial coordinate. Suggestions are given for the preparation of films with prescribed properties.

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References

  1. S. A. Kukushkin and V. V. Slezov, Dispersive Systems on Solid Surfaces (Evolutionary Approach: Mechanisms of Thin Film Formation [in Russian] (Nauka, St. Petersburg, 1996), 312 pp.

    Google Scholar 

  2. G. A. Razuvaev, B. G. Gribov et al., Metalorganic Compounds in Micro Electronics [in Russian] (Nauka, Moscow, 1972), 479 pp.

    Google Scholar 

  3. A. N. Vorob’ev, E. A. Garibin et al., Vysokochistye Veshchestva, No. 3, 41 (1996).

  4. E. A. Garibin, I. A. Mironov, S. E. Khorushnikov, and A. N. Vorob’ev, Mater. Sci. Eng., B 39, 8 (1996).

    Article  Google Scholar 

  5. A. B. Zhidkov, S. A. Kukushkin, E. P. Smirnov, and A. T. Denisova, Poverkhnost’, No. 4, 71 (1990).

  6. S. A. Kukushkin and A. V. Osipov, Prog. Surf. Sci. 51(1), 1 (1996).

    Article  Google Scholar 

  7. S. A. Kukushkin, Fiz. Tverd. Tela (St. Petersburg) 35, 1582 (1993) [Phys. Solid State 35, 797 (1993)].

    Google Scholar 

  8. S. A. Kukushkin, Fiz. Tverd. Tela (St. Petersburg) 35, 1597 (1993) [Phys. Solid State 35, 804 (1993)].

    Google Scholar 

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Authors and Affiliations

  1. Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, 199178, St. Petersburg, Russia

    D. A. Grigor’ev & S. A. Kukushkin

Authors
  1. D. A. Grigor’ev
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  2. S. A. Kukushkin
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Zh. Tekh. Fiz. 68, 111–117 (July 1998)

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Grigor’ev, D.A., Kukushkin, S.A. Mechanisms and kinetics of the initial stages of growth of films grown by chemical vapor deposition. Tech. Phys. 43, 846–852 (1998). https://doi.org/10.1134/1.1259082

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  • DOI: https://doi.org/10.1134/1.1259082

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