Abstract
In the usual thickness range of sputtered metallic films, analytical linearized approximate expressions of polycrystalline film resistivity and its t.c.r. are deduced from the Mayadas-Shatzkes theoretical equations. A good experimental fit is observed for Al rf sputtered metal films.
Similar content being viewed by others
References
A.F.Mayadas, M.Shatzkes: Phys. Rev. B1, 1382 (1970)
A.Singh: Thin Films2, 159 (1972)
A.Singh: Proc. IEEE61, 1653 (1973)
A.Singh: J. Appl. Phys.45, 1908 (1974)
E.E.Mola, J.M.Heras: Thin Solid Films18, 137 (1973)
B.Singh, C.C.Ling, N.A.Surplice: Thin Solid Films23, S50 (1974)
C.R.Tellier, A.J.Tosser: Thin Solid Films43, 261 (1977)
C.R.Tellier, A.J.Tosser: Thin Solid Films33, L19 (1976)
J.Borrajo, J.M.Heras: Thin Solid Films18, 267 (1973)
C.R.Tellier, A.J.Tosser: Thin Solid Films35, 65 (1976)
C.R.Tellier, A.J.Tosser: Thin Solid Films37, 207 (1976)
A.Tosser, C.Tellier, J.Launey: Int. Symp. on Vacuum and Thin Film Technol., Uppsala (Sweden 1976) Abstr. E31, p. 50
B.Laville Saint Martin: Thin Solid Films5, 169 (1969)
B.Laville Saint Martin: Thin Solid Films6, 359 (1969)
C.R.Tellier, R.C.Boutrit, A.J.Tosser: Internal note, University of Nancy (1977)
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Tellier, C.R., Tosser, A.J. Analytical approximate equations for the resistivity and its temperature coefficient in thin polycrystalline metallic films. Appl. Phys. 14, 221–224 (1977). https://doi.org/10.1007/BF00883093
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF00883093