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High density interconnect substrates using multilayer thin film technology on laminate substrates (MCM‐SL/D)

Eric Beyne (IMEC, Leuven, Belgium)
Rita Van Hoof (IMEC, Leuven, Belgium)
Tomas Webers (IMEC, Leuven, Belgium)
Steven Brebels (IMEC, Leuven, Belgium)
Stéphanie Rossi (CIMULEC, Ennery, France)
François Lechleiter (CIMULEC, Ennery, France)
Marianna Di Ianni (CiaoLab Technologies, Pregnana‐Milanese, Italy)
Andreas Ostmann (TUBerlin, Berlin, Germany)

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 December 2001

843

Abstract

A novel interconnect technology, introducing thin film on a laminate substrate base, is presented. A specially constructed laminate board is used as a substrate for the thin film build‐up process. The main characteristics of the laminate core substrate are the z‐axis electrical connections, the absence of holes in the substrate and the very flat nature of the top surface. As a result, the base substrate can be processed further in a thin film processing line. The manufacturing and properties of these substrates are discussed.

Keywords

Citation

Beyne, E., Van Hoof, R., Webers, T., Brebels, S., Rossi, S., Lechleiter, F., Di Ianni, M. and Ostmann, A. (2001), "High density interconnect substrates using multilayer thin film technology on laminate substrates (MCM‐SL/D)", Microelectronics International, Vol. 18 No. 3, pp. 36-42. https://doi.org/10.1108/EUM0000000005830

Publisher

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MCB UP Ltd

Copyright © 2001, MCB UP Limited

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