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Point defect trapping at111In in copper after ion implantation

  • Radiation Damage, Defects
  • Implantation, Impurities
  • Published:
Hyperfine Interactions Aims and scope Submit manuscript

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References

  1. H. Frauenfelder and R.M. Steffen, in Alpha-, Beta-, and Gamma-Ray Spectroscopy, edited by K. Siegbahn (North-Holland, Amsterdam, 1965), p. 1101.

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Authors and Affiliations

  1. FB Physik, Universität Konstanz, 7750, Konstanz, W. Germany

    O. Echt, E. Recknagel, A. Weidinger & Th. Wichert

Authors
  1. O. Echt
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  2. E. Recknagel
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  3. A. Weidinger
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  4. Th. Wichert
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Additional information

Supported in part by the Bundesminister fur Forschung und Technologie and by the Gesellschaft fur Kernforschung mbH., Karlsruhe

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Echt, O., Recknagel, E., Weidinger, A. et al. Point defect trapping at111In in copper after ion implantation. Hyperfine Interact 4, 706–709 (1978). https://doi.org/10.1007/BF01021917

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  • DOI: https://doi.org/10.1007/BF01021917

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