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Etching kinetics of the low temperature chemically vapour deposited SiO2 films

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Microelectronica, Str. Erou Iancu Nicolae 34 B, R-72996, Bucharest, Romania

    C. Pavelescu & C. Cobianu

  2. Faculty of Chemical Engineering, B-dul Republicii 13, R-70031, Bucharest, Romania

    E. Segal (Chair of Physical Chemistry, and Electrochemical Technology)

Authors
  1. C. Pavelescu
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  2. C. Cobianu
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  3. E. Segal
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Pavelescu, C., Cobianu, C. & Segal, E. Etching kinetics of the low temperature chemically vapour deposited SiO2 films. J Mater Sci Lett 3, 643–646 (1984). https://doi.org/10.1007/BF00719636

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  • DOI: https://doi.org/10.1007/BF00719636

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