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Determination of the stoichiometry of vanadium nitride films by proton back-scattering

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Abstract

Vanadium nitride films were grown on stainless steel and silicon, with different nitrogen concentrations by varying the partial pressures of nitrogen in a DC magnetron sputtering set up. These films were characterized for their composition by proton back-scattering and their micro hardness values were correlated with their N/V ratio.

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Authors and Affiliations

  1. Analytical Chemistry Division B.A.R.C., 85, Bombay, (India)

    J. V. Ramana, V. S. Raju & S. Gangadharan

  2. Laser and Plasma Technology Division B.A.R.C., 85, Bombay, (India)

    A. K. Ray

  3. Indian Institute of Technology, 85, Bombay, (India)

    R. S. Srinivasa & A. N. Chandorkar

Authors
  1. J. V. Ramana
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  2. V. S. Raju
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  3. A. K. Ray
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  4. S. Gangadharan
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  5. R. S. Srinivasa
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  6. A. N. Chandorkar
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Ramana, J.V., Raju, V.S., Ray, A.K. et al. Determination of the stoichiometry of vanadium nitride films by proton back-scattering. Journal of Radioanalytical and Nuclear Chemistry, Articles 174, 265–270 (1993). https://doi.org/10.1007/BF02037913

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  • DOI: https://doi.org/10.1007/BF02037913

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