Abstract
The surface composition of the oxide formed on thin-film and solid OFHC copper samples exposed to a fast-atomic-oxygen environment in a low-earth orbit on NASA's Long Duration Exposure Facility (LDEF) was investigated using X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), thin-film X-ray diffraction (TF-XRD), high-resolution profilometry, and reflectance measurements. The results confirm that it is easier to form thick copper oxide layers in the atomic oxygen ambient than is normally possible with other laboratory-based techniques.
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Raikar, G.N., Gregory, J.C. & Peters, P.N. Oxidation of copper by fast atomic oxygen. Oxid Met 42, 1–15 (1994). https://doi.org/10.1007/BF01061921
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DOI: https://doi.org/10.1007/BF01061921