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The effects of low-ionization-potential contaminants on thermal plasmas

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Abstract

Plasmas consisting of a high-ionization-potential component mixed with a low-ionization-potential contaminant are common in industrial processes. Modeling results are presented for a sodium-contaminated nitrogen plasma column operating either in a free-burning (low-temperature) mode or operating in a constricted (high-temperature) mode. At sufficiently high plasma temperatures, the behavior is dominated by the high-ionization-potential component's properties. The low-ionization-potential contaminant's properties determine the low-temperature plasma behavior even when the contaminant is present in relatively small quantities.

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Johnson, D.C., Pfender, E. The effects of low-ionization-potential contaminants on thermal plasmas. Plasma Chem Plasma Process 3, 259–273 (1983). https://doi.org/10.1007/BF00566024

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  • DOI: https://doi.org/10.1007/BF00566024

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