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Investigation of the thermal stability of Ni/C multilayers by X-ray methods

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Abstract

Microstructural properties of Ni/C multilayers prepared by PLD (pulsed laser deposition) have been investigated after heat treatment in vacuum at temperatures in the range of 50°C to 500°C. X-ray diffractometry, X-ray reflectometry, fluorescence EXAFS (extended X-ray absorption fine structure) and HREM (high resolution transmission electron microscopy) have been applied to characterize samples in the initial state and after annealing. The multilayer reflectivity remained unchanged or increased at temperatures below 400°C due to sharpening of the interfaces caused by the formation of α-nickel and nickel carbide. The reflectivity decreased at temperatures above 400°C because of the fragmentation of the nickel layers. It can be shown, that both chemical and mechanical driving forces are responsible for the observed modifications of the initial specimen state.

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Authors and Affiliations

  1. Institut für Kristallographie und Festkörperphysik, TU Dresden, Mommsenstrasse 13, D-01069, Dresden, Germany

    R. Krawietz, B. Wehner, D. Meyer & K. Richter

  2. Fraunhofer-Institut für Werkstoffphysik und Schichttechnologie, Helmholtzstrasse 20, D-01069, Dresden, Germany

    H. Mai & R. Dietsch

  3. Max-Planck-Institut für Mikrostrukturphysik, Am Weinberg 2, D-06120, Halle, Germany

    S. Hopfe & R. Scholz

  4. Max-Planck-Arbeitsgruppe an der TU Dresden, Hallwachsstrasse 13, D-01069, Dresden, Germany

    W. Pompe

Authors
  1. R. Krawietz
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  2. B. Wehner
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  3. D. Meyer
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  4. K. Richter
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  5. H. Mai
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  6. R. Dietsch
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  7. S. Hopfe
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  8. R. Scholz
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  9. W. Pompe
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Krawietz, R., Wehner, B., Meyer, D. et al. Investigation of the thermal stability of Ni/C multilayers by X-ray methods. Fresenius J Anal Chem 353, 246–250 (1995). https://doi.org/10.1007/BF00322045

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  • DOI: https://doi.org/10.1007/BF00322045

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