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Interdiffusion, reaction, and stability in a thin film iron-aluminium bilayered system

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Abstract

In this work we describe the results of Rutherford backscattering spectrometry, sheet resistivity measurements, X-ray diffractometry and conversion electron Mössbauer spectroscopy performed on thin film Fe-Al bilayered samples submitted to high vacuum furnace annealing. Isothermal anneals were performed at 570 K for time intervals ranging from 60 to 600 min. It is demonstrated that the diffusion of Al into Fe is smaller than the diffusion of Fe into Al for temperatures below 600 K. Sequential isochronous thermal anneals of 60 min were performed at temperatures ranging from 570 to 870 K, in order to study the stability of the formed phases. The stable Fe2Al5 intermetallic compound formed at 570 K decomposes at about 650 K, and the FeAl6 intermetallic compound appears at temperatures around 750 K.

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References

  1. V.V. Nemoshkalenco, O.N. Rasumov, V.V. Gorskii: Phys. Stat. Solidi29, 45 (1968)

    Google Scholar 

  2. G.M. Hood: Philos. Mag.21, 305 (1970)

    Google Scholar 

  3. C.A. Stickels, R.H. Bush: Metall. Trans.2, 2031 (1971)

    Google Scholar 

  4. R.S. Preston: Metall. Trans.3, 1831 (1972)

    Google Scholar 

  5. J. Hirvonen, J. Räisänen: J. Appl. Phys.53, 3314 (1982)

    Google Scholar 

  6. K.K. Fung, C.Y. Young, Y.Q. Zhou, J.G. Zhao, W.S. Zhan, B.G. Shen: Phys. Rev. Lett.56, 2060 (1986)

    Google Scholar 

  7. A. Griger, V. Stefàniay, T. Turmezey: Z. Metallkde.77, 30 (1986)

    Google Scholar 

  8. R.A. Dunlap, K. Dini: Can. J. Phys.63, 1267 (1985)

    Google Scholar 

  9. R.A. Dunlap, K. Dini, G. Stroink, G.S. Collins, S. Jha: Hyper. Inter.28, 963 (1986)

    Google Scholar 

  10. R.W. Balluffi, J.M. Blakely: Thin Solid Films25, 399 (1975)

    Google Scholar 

  11. G. Ottaviani: J. Vac. Sci. Technol.16, 1112 (1979)

    Google Scholar 

  12. D. Gupta, P.S. Ho: Thin Solid Films72, 399 (1980)

    Google Scholar 

  13. K.L. Chopra, I. Kour:Thin Film Device Applications (Plenum, New York 1983)

    Google Scholar 

  14. K.N. Tu: Ann. Rev. Mater. Sci.15, 147 (1985)

    Google Scholar 

  15. S.R. Teixeira, P.H. Dionisio, E.F. da Silveira, F.L. Freire, Jr., W.H. Schreiner, I. J.R. Baumvol: Mat. Sci. Eng.96, 267 (1987)

    Google Scholar 

  16. S.R. Teixeira, P.H. Dionisio, M.A.Z. Vasconcellos, E.F. da Silveira, W.H. Schreiner, I.J.R. Baumvol: Mat. Soc. Eng.96, 279 (1987)

    Google Scholar 

  17. S.R. Teixeira, C.A. dos Santos, P.H. Dionisio, W.H. Schreiner, U.R. Baumvol: Mat. Sci. Eng.96, 285 (1987)

    Google Scholar 

  18. P.G.Shewman:Diffusion in Solids (McGraw-Hill, New York 1963)

    Google Scholar 

  19. A.B. Campbell, B.D. Startwell, P.B. Needham, Jr.: J. Appl. Phys.51, 283 (1980)

    Google Scholar 

  20. K. Hirano, R.P. Agarwala, M. Chen: Acta Metall.10, 857 (1962)

    Google Scholar 

  21. W. Alexander, L.M. Slifkin: Bull. Am. Phys. Soc.14, 388 (1969)

    Google Scholar 

  22. J. Miki, H. Warlimont: Z. Metallkde.59, 255 (1968)

    Google Scholar 

  23. J. Miki, H. Warlimont: Z. Metallkde.59, 408 (1968)

    Google Scholar 

  24. O. Kubaschevski:Iron Binary Phase Diagrams (Springer, Berlin, Heidelberg 1982)

    Google Scholar 

  25. H. Harada, S. Ishibe, R. Konishi, H. Sasakura: JPN. J. Appl. Phys.24, 1141 (1985)

    Google Scholar 

  26. G. Longworth, R. Jain: J. Phys. F8, 351 (1978)

    Google Scholar 

  27. Yu.S. Nechayev, Yu.A. Krupin, Yu.A. Mezhennyy, Yu.A. Pustov, L.N. Rastorguyev: Phys. Met. Metall.58, 115 (1984)

    Google Scholar 

  28. E.H. Hollingsworth, G.R. Frank, Jr., R.E. Willett: Metal. Trans. Soc. AIME224, 188 (1962)

    Google Scholar 

  29. R. Wang, J. Gui, S. Yao, Y. Cheng, G. Lu, M. Huang: Philos. Mag. B54, L33 (1986)

    Google Scholar 

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Authors and Affiliations

  1. Instituto de Fìsica, Universidade Federal do Rio Grande do Sul, Campus do Vale, 90049, Porto Alegre, Brasil

    S. R. Teixeira & I. J. R. Baumvol

  2. Departamento de Fìsica, Pontificia Universidade Catòlica do Rio de Janeiro, 22452, Rio de Janeiro, Brasil

    F. L. Freire Jr.

Authors
  1. S. R. Teixeira
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  2. F. L. Freire Jr.
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  3. I. J. R. Baumvol
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Work supported in part by CNPq and FINEP

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Teixeira, S.R., Freire, F.L. & Baumvol, I.J.R. Interdiffusion, reaction, and stability in a thin film iron-aluminium bilayered system. Appl. Phys. A 48, 481–488 (1989). https://doi.org/10.1007/BF00619722

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  • DOI: https://doi.org/10.1007/BF00619722

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