Skip to main content
Log in

Ta2O5 thin-films deposited by off-axis and on-axis pulsed laser deposition techniques

  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract.

The crystalline properties of Ta2O5 thin films deposited by an off-axis aperture-installation-type pulsed laser deposition technique are investigated and the results are compared with the results for films deposited by the conventional on-axis technique. No significant difference in the substrate temperature dependence is seen between films deposited on-axis or off-axis at a pulse repetition frequency of 30 Hz. When the repetition frequency is lowered, the degree of c-axis orientation is increased in both films. This tendency is more pronounced in the off-axis films. Therefore it is found that the off-axis aperture-installation-type pulsed laser deposition technique is effective not only for decreasing the density of droplets, but also for obtaining more highly c-axis-oriented crystalline films.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

Author information

Authors and Affiliations

Authors

Additional information

Received: 21 July 1999 / Accepted: 1 September 1999 / Published online: 22 December 1999

Rights and permissions

Reprints and permissions

About this article

Cite this article

Inoue, N., Ninomiya, T., Kashiwabara, S. et al. Ta2O5 thin-films deposited by off-axis and on-axis pulsed laser deposition techniques . Appl Phys A 69 (Suppl 1), S609–S612 (1999). https://doi.org/10.1007/s003390051487

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1007/s003390051487

Navigation