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Pulsed laser deposition of carbon nitride films by a sub-ps laser

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Abstract.

CNx (0.01<x<0.06) films were grown from a graphite target by pulsed laser deposition in a low-pressure nitrogen environment at room temperature, using a sub-psultraviolet laser. With increasing nitrogen pressure from 3×10-2 to 0.6 mbar the nitrogen content of the films increases monotonously, as determined by X-ray photoelectron spectroscopy. Raman spectroscopy reveals that the films consist predominantly of highly amorphous carbon.

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Received: 10 September 1999 / Accepted: 11 September 1999 / Published online: 3 December 1999

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Geretovszky, Z., Kántor, Z., Bertóti, I. et al. Pulsed laser deposition of carbon nitride films by a sub-ps laser . Appl Phys A 70, 9–11 (2000). https://doi.org/10.1007/s003390050003

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  • DOI: https://doi.org/10.1007/s003390050003

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