Properties of titanium solid solutions prepared by reactive sputtering

doi:10.1016/0022-0248(78)90462-1

Journal of Crystal Growth

Volume 45, December 1978, Pages 350-354

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Abstract

Films of titanium solid solutions Ti-X_x (X = C, N, or O) of the hexagonal phase were prepared on glass substrates heated at 350°C in a mixture of argon and the reactive gas with controlled partial pressures from 2×10⁻⁶ to 8×10⁻³ Torr. The maximum solubilities of C, N, and O in Ti were estimated to be 0.05, 0.46, and 0.28, respectively. The observed values of the maximum solubilities are discussed in connection with the structural and electrical properties.

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Composition tunablity and correlated property analysis of titanium nitride films for plasmonic applications
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Recent developments in the area of plasmonics demand novel and cost-effective materials with desirable optical and electrical properties to employ in various low-cost sensing device technologies. This study examines relationship between the synthesis conditions of the advanced ceramic material, titanium nitride and the resulting structural and plasmonic properties in the visible wavelength. The utilization of RF sputtering with a change in Ti/N ratio produced films exhibiting metal rich, stoichiometric composition, and nitrogen abundance nature, as verified using x-ray photoelectron spectroscopic analysis. The analysis of defect chemistry is carried out using Raman spectroscopy and subsequently linked it with the analysis of grazing incidence x-ray diffraction (GI-XRD). The findings derived from the investigations on electrical properties by Hall measurement are combined with the dielectric permittivity functions derived using Drude-Lorentz approximation of the reflectance spectra of the films, along with the roughness analysis obtained from the atomic force microscopy (AFM). The investigation demonstrated a red shift in crossover wavelength with decrease in the carrier density. The studies revealed an enhanced negative permittivity in the films. A three-layer geometry was used in Kretschmann configuration to predict the excitation of surface plasmon polaritons with narrow full width at half maximum.
The N-Ti (Nitrogen-Titanium) system
1987, Bulletin of Alloy Phase Diagrams

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Properties of titanium solid solutions prepared by reactive sputtering

Abstract

Thin Solid Films

The Nature of the Chemical Bond

J. Metals

Acta Chem. Scand.

J. Phys. Soc. Japan

Elements of X-ray Diffraction