DC-magnetron sputtering of YBa2Cu3O7−δ thin films for microwave applications

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Abstract

High-quality YBa2Cu3O7−δ thin films with optimized surface smoothens suitable for multilayer technology have been deposited by DC-magnetron sputtering. The films not only show high critical temperatures (Tc) up to 90 K and high critical current densities (jc) up to 4.2×106 A/cm2 at 77 K, but also a smooth surface with only one outgrowth of a size of more than 200 nm within an area of 150×150 μm2. The Tc and jc values are slightly lower than our best values for rough films with optimized conditions for Tc and jc, where we reach up to 6×106 A/cm2 at 77 K and a Tc offset up to 91.5 K on SrTiO3 and La AlO3. Additionally, the surface resistances (Rs) of our films were measured using coplanar resonators. We determined an Rs of 120 μΩ at 77 K and 60 μΩ at 9 K and at 6.2 GHz for our best film. The penetration depth was evaluated to be between 160 and 200 nm for this film. A dependence of Rs on the surface magnetic field showed a higher crystal quality of our films with increasing jc measured with a remanent field technique.

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