Elsevier

Physics Letters A

Volume 91, Issue 5, 13 September 1982, Pages 231-233
Physics Letters A

Comparison of solubility limits and electrical activities for antimony and arsenic ion implanted silicon

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Abstract

Ion channeling and electrical measurements have been employed to determine the solubility limits and electrical activities for antimony and arsenic ion implanted silicon following a variety of annealing schedules. Comparisons with reported equilibrium solubility limits highlight important differences between the stability of supersaturated solid solutions of arsenic and antimony in silicon.

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