Thermal- and radiation-stability of hydrogen-implanted silicon standards for ion-beam analysis
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Hydrogen detection near surfaces and shallow interfaces with resonant nuclear reaction analysis
2014, Surface Science ReportsCitation Excerpt :Although not necessarily a strict requirement, convenient standards furthermore offer long-term stability, in particular under the ion beam, so that they can be used repeatedly. A variety of materials that fulfill the above demands more or less ideally has been proposed as calibration standards, among them hydrogenated thin films of Ti [100] and Ta foil [204,206], hydrogenated films of pyrolytic carbon [204], amorphous silicon [204,207,208], and silicon nitride [110], hydrogen-implanted Si [71,207,209], as well as the polymers polystyrene [210], polypropylene (C3H6)n, polyester, Mylar (C10H8O4)n, Kapton®(C22H10O5N2)n [205,211], as well as H2 gas [212]. The hydrogenated thin film materials have been confirmed to show quite favorable properties, such as long-term stability in UHV as well as under the 15N NRA ion irradiation, and sufficient conductivity for proper charge integration.
Round Robin: Measurement of H implantation distributions in Si by elastic recoil detection
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